Field-effect transistor (FET) device with thin films of C_ has been fabricated with Eu electrodes exhibiting small work function. The C_ FET device shows n-channel FET properties with high field-effect mobility, 0.50 cm^2 V^ s^. Furthermore, nonvanishing drain current, i.e., normally on, is observed in this FET device. This originates from small energy barrier for electron from Eu source electrode to lowest unoccupied molecular orbital of C_
© 2008 American Institute of Physics. The electronic version of this article is the complete one and...
A flexible C_ field-effect transistor (FET) device has been fabricated with a polyimide gate insulat...
Carbon nanotube‐based field‐effect transistors (CNTFETs) have been fabricated using nanometer thin d...
Field-effect transistor (FET) device with thin films of C60 has been fabricated with Eu electrodes e...
We report the transport properties of C_ thin film field-effect transistors (FETs) with a channel of...
N-channel field effect transistors with excellent device characteristics have been fabricated by uti...
N‐channel field effect transistors with excellent device characteristics have been fabricated by uti...
A field-effect transistor (FET) device was fabricated with thin films of C2v isomer of Pr@C82. This ...
C_ field-effect transistors (FETs) have been fabricated with source/drain electrodes of three differ...
Field-effect transistor (FET) devices with thin films of perylene have been fabricated with various ...
We report an improvement in performance of C_ thin-film field-effect transistors (TFTs) fabricated b...
N-channel field effect transistors (FETs) were fabricated with thin films of C_ and Dy@C_. A typical...
A fullerene field-effect transistor (FET) device has been fabricated with thin films of C88, and n-c...
Fullerene field-effect transistors (FETs) were fabricated with thin films of C_, which showedn-chann...
Endohedral metallofullerene field-effect transistor (FET) device was fabricated with thin films of C...
© 2008 American Institute of Physics. The electronic version of this article is the complete one and...
A flexible C_ field-effect transistor (FET) device has been fabricated with a polyimide gate insulat...
Carbon nanotube‐based field‐effect transistors (CNTFETs) have been fabricated using nanometer thin d...
Field-effect transistor (FET) device with thin films of C60 has been fabricated with Eu electrodes e...
We report the transport properties of C_ thin film field-effect transistors (FETs) with a channel of...
N-channel field effect transistors with excellent device characteristics have been fabricated by uti...
N‐channel field effect transistors with excellent device characteristics have been fabricated by uti...
A field-effect transistor (FET) device was fabricated with thin films of C2v isomer of Pr@C82. This ...
C_ field-effect transistors (FETs) have been fabricated with source/drain electrodes of three differ...
Field-effect transistor (FET) devices with thin films of perylene have been fabricated with various ...
We report an improvement in performance of C_ thin-film field-effect transistors (TFTs) fabricated b...
N-channel field effect transistors (FETs) were fabricated with thin films of C_ and Dy@C_. A typical...
A fullerene field-effect transistor (FET) device has been fabricated with thin films of C88, and n-c...
Fullerene field-effect transistors (FETs) were fabricated with thin films of C_, which showedn-chann...
Endohedral metallofullerene field-effect transistor (FET) device was fabricated with thin films of C...
© 2008 American Institute of Physics. The electronic version of this article is the complete one and...
A flexible C_ field-effect transistor (FET) device has been fabricated with a polyimide gate insulat...
Carbon nanotube‐based field‐effect transistors (CNTFETs) have been fabricated using nanometer thin d...