The plastic deformation of TiN thin films was considered by the hardness anisotropy of these films with the (111) and (200) preferred orientation. These hardness were measured by the nano-indentation technique as have already been reported. The plastic deformation of TiN films were caused by indentation of the trigonal diamond tip, and the evidence of this phenomenon was given by the cross-sectional SEM observation and the TED analysis. The influence of difference of residual stress and grain size on the hardness anisotropy was restrictive, and the hardness anisotropy can be explained by the anisotropy of the yield stress calculated by Schmid's law. This relationship suggests the existence of {100} <110> slip system of TiN crystal. The TEM ...
[[abstract]]Titanium nitride (TiN) films were deposited on 304 stainless steel substrate by hollow c...
In this paper we discuss various contact damage modes in thin TiN films on steel substrate with incr...
Abstract. Nanocrystalline TiN thin films were deposited on glass substrate by d.c. magnetron sputter...
TiN films with the(111)and(200)preferred orientations were formed on Si(100)and sapphire(0001)substr...
The deformation mechanisms and contact response of TiN-based thin films deposited onto a soft substr...
Nanoindentation experiments were carried out on a columnar similar to1.5-mum-thick TiN film on steel...
The effects of various experimental conditions on the preferred orientations of titanium nitride (Ti...
The effects of strain energy on the preferred orientation of TiN thin films were investigated. In th...
Nanocomposite TiN/Si_3N_4 thin films were deposited by ion-assisted deposition (IAD) in a reactive g...
A columnar TiN film under contact loading fails by shear fracture along inter-columnar boundaries. T...
Titanium nitride (TiN) coatings were deposited by d.c. reactive magnetron sputtering process. The fi...
Titanium nitride (TiN) coatings offer improvements in resistance to wear and environmental degradati...
TiN/Ta multilayer film with a modulation period of 5.6 nm and modulation ratio of 1 : 1 was produced...
Abstract: Titanium nitride thin films deposited by reactive dc magnetron sputtering under various su...
[[abstract]]Titanium nitride (TiN) film was deposited on 304 stainless steel using a hollow cathode ...
[[abstract]]Titanium nitride (TiN) films were deposited on 304 stainless steel substrate by hollow c...
In this paper we discuss various contact damage modes in thin TiN films on steel substrate with incr...
Abstract. Nanocrystalline TiN thin films were deposited on glass substrate by d.c. magnetron sputter...
TiN films with the(111)and(200)preferred orientations were formed on Si(100)and sapphire(0001)substr...
The deformation mechanisms and contact response of TiN-based thin films deposited onto a soft substr...
Nanoindentation experiments were carried out on a columnar similar to1.5-mum-thick TiN film on steel...
The effects of various experimental conditions on the preferred orientations of titanium nitride (Ti...
The effects of strain energy on the preferred orientation of TiN thin films were investigated. In th...
Nanocomposite TiN/Si_3N_4 thin films were deposited by ion-assisted deposition (IAD) in a reactive g...
A columnar TiN film under contact loading fails by shear fracture along inter-columnar boundaries. T...
Titanium nitride (TiN) coatings were deposited by d.c. reactive magnetron sputtering process. The fi...
Titanium nitride (TiN) coatings offer improvements in resistance to wear and environmental degradati...
TiN/Ta multilayer film with a modulation period of 5.6 nm and modulation ratio of 1 : 1 was produced...
Abstract: Titanium nitride thin films deposited by reactive dc magnetron sputtering under various su...
[[abstract]]Titanium nitride (TiN) film was deposited on 304 stainless steel using a hollow cathode ...
[[abstract]]Titanium nitride (TiN) films were deposited on 304 stainless steel substrate by hollow c...
In this paper we discuss various contact damage modes in thin TiN films on steel substrate with incr...
Abstract. Nanocrystalline TiN thin films were deposited on glass substrate by d.c. magnetron sputter...