III-Nitride (III-N) semiconductors with wide bandgap (WBG) characteristics offer promising advancements for high power density, high voltage, and high-frequency applications, presenting a promising alternative to traditional silicon (Si) technology. However, native substrate material for the majority of WBG semiconductors is still not commercially affordable. Because of its highly mature progression, utilizing standard Si wafers as substrates is a cost-effective alternative. This dissertation explores the development of electronic devices based on III-N thin films, grown monolithically via molecular beam epitaxy (MBE), followed by several processing techniques. Initially, a heterojunction p-n diode is realized, incorporating the growth of s...
GaN-based high-electron-mobility transistors (HEMTs) will play an important role in the next generat...
This thesis focuses on III-Nitrides for electronic and gas sensing devices. Systematic material grow...
The III-nitride materials, consisting of Al, Ga, In and N, have several physical properties that mak...
III-Nitride (III-N) semiconductors with wide bandgap (WBG) characteristics offer promising advanceme...
Three-nitride (III-N) materials have been widely introduced into our everyday lives. Indium gallium ...
The industrial level technologies including molecular beam epitaxy and submicron planar processing a...
In this chapter, the different growth techniques of plasma‐assisted molecular beam epitaxy (PAMBE) a...
Heterostructure devices based on the AlInN material system have demonstrated unprecedented high freq...
The III-nitride semiconductor materials have wide direct bandgap ranging from 6.2 eV (AlN); through ...
The III-Nitrides were intensively studied during the last few years due to its tunable band gap rang...
Post the commercialization and widespread use in light emitting diodes (LEDs), heterostructures of I...
Through the history of mankind, novel materials have played a key role in techno- logical progr...
The combination of wide band-gap and built-in electrical polarization renders III-nitride HEMTs idea...
The fabrication processes development for on III-nitride (III-N) heterojunction bipolar transistors ...
Gallium nitride based High Electron Mobility Transistors (HEMT) with ultra-thin AlN barriers are dev...
GaN-based high-electron-mobility transistors (HEMTs) will play an important role in the next generat...
This thesis focuses on III-Nitrides for electronic and gas sensing devices. Systematic material grow...
The III-nitride materials, consisting of Al, Ga, In and N, have several physical properties that mak...
III-Nitride (III-N) semiconductors with wide bandgap (WBG) characteristics offer promising advanceme...
Three-nitride (III-N) materials have been widely introduced into our everyday lives. Indium gallium ...
The industrial level technologies including molecular beam epitaxy and submicron planar processing a...
In this chapter, the different growth techniques of plasma‐assisted molecular beam epitaxy (PAMBE) a...
Heterostructure devices based on the AlInN material system have demonstrated unprecedented high freq...
The III-nitride semiconductor materials have wide direct bandgap ranging from 6.2 eV (AlN); through ...
The III-Nitrides were intensively studied during the last few years due to its tunable band gap rang...
Post the commercialization and widespread use in light emitting diodes (LEDs), heterostructures of I...
Through the history of mankind, novel materials have played a key role in techno- logical progr...
The combination of wide band-gap and built-in electrical polarization renders III-nitride HEMTs idea...
The fabrication processes development for on III-nitride (III-N) heterojunction bipolar transistors ...
Gallium nitride based High Electron Mobility Transistors (HEMT) with ultra-thin AlN barriers are dev...
GaN-based high-electron-mobility transistors (HEMTs) will play an important role in the next generat...
This thesis focuses on III-Nitrides for electronic and gas sensing devices. Systematic material grow...
The III-nitride materials, consisting of Al, Ga, In and N, have several physical properties that mak...