ABSTRACT: Nanowires are promising platforms for realizing ultra-compact light sources for photonic integrated circuits. In contrast to impressive progress on light confinement and stimulated emission in III-V and II-VI semiconductor nanowires, there has been no experimental demonstration showing the potential to achieve strong cavity effects in a bottom-up grown single group-IV nanowire, which is a prerequisite for realizing silicon-compatible infrared nanolasers. Herein, we address this limitation and present an experimental observation of cavity-enhanced strong photoluminescence from a single Ge/GeSn core/shell nanowire. A sufficiently large Sn content ( ~ 10 at%) in the GeSn shell leads to a direct bandgap gain medium, allowing a strong ...
GeSn alloys with Sn contents of 8.4 % and 10.7 % are grown pseudomorphically on Ge buffers on Si (00...
Miniature, low-consumption and efficient light sources are of major importance for the spreading of ...
The strong correlation between advancing the performance of Si microelectronics and their demand of ...
Group IV semiconductor optoelectronic devices are now possible by using strain-free direct band gap ...
Group IV Ge1-xSnx semiconductors hold the premise of enabling broadband silicon-integrated infrared ...
Highly oriented Ge 0.81Sn 0.19 nanowires have been synthesized by a low-temperature chemical vapor d...
Ge1–xSnx nanowires incorporating a large amount of Sn would be useful for mobility enhancement in na...
Peer Reviewedhttps://deepblue.lib.umich.edu/bitstream/2027.42/138881/1/adfm201702364_am.pdfhttps://d...
The race to create alternative, Si compatible, scalable, tuneable device materials over the past num...
peer-reviewedGe1−xSnx nanowires incorporating a large amount of Sn would be useful for mobility enha...
Sn-containing Si and Ge (Ge1-y-xSixSny) alloys are an emerging family of semiconductors with the pot...
The realization of a semiconductor near-unity absorber in the infrared will provide new capabilities...
GeSn alloys are a promising emerging complementary metal–oxide–semiconductor compatible technology f...
The experimental demonstration of fundamental direct bandgap, group IV GeSn alloys has constituted a...
SiGeSn ternaries are grown on Ge-buffered Si wafers incorporating Si or Sn contents of up to 15 at%....
GeSn alloys with Sn contents of 8.4 % and 10.7 % are grown pseudomorphically on Ge buffers on Si (00...
Miniature, low-consumption and efficient light sources are of major importance for the spreading of ...
The strong correlation between advancing the performance of Si microelectronics and their demand of ...
Group IV semiconductor optoelectronic devices are now possible by using strain-free direct band gap ...
Group IV Ge1-xSnx semiconductors hold the premise of enabling broadband silicon-integrated infrared ...
Highly oriented Ge 0.81Sn 0.19 nanowires have been synthesized by a low-temperature chemical vapor d...
Ge1–xSnx nanowires incorporating a large amount of Sn would be useful for mobility enhancement in na...
Peer Reviewedhttps://deepblue.lib.umich.edu/bitstream/2027.42/138881/1/adfm201702364_am.pdfhttps://d...
The race to create alternative, Si compatible, scalable, tuneable device materials over the past num...
peer-reviewedGe1−xSnx nanowires incorporating a large amount of Sn would be useful for mobility enha...
Sn-containing Si and Ge (Ge1-y-xSixSny) alloys are an emerging family of semiconductors with the pot...
The realization of a semiconductor near-unity absorber in the infrared will provide new capabilities...
GeSn alloys are a promising emerging complementary metal–oxide–semiconductor compatible technology f...
The experimental demonstration of fundamental direct bandgap, group IV GeSn alloys has constituted a...
SiGeSn ternaries are grown on Ge-buffered Si wafers incorporating Si or Sn contents of up to 15 at%....
GeSn alloys with Sn contents of 8.4 % and 10.7 % are grown pseudomorphically on Ge buffers on Si (00...
Miniature, low-consumption and efficient light sources are of major importance for the spreading of ...
The strong correlation between advancing the performance of Si microelectronics and their demand of ...