Theoretical Study of Localized Electric Field Enhancement for Plasmonic Nano-Imaging via Graphene-Based Heterogeneous U-Shaped Multi-Nanogaps Superlens

In the recent times, Graphene 2-D material has risen as a promising platform for opto-electronics and hybrid-based nanophotonic devices due to its optical characteristics large carrier mobility. The plasmonic U-shaped superlens photolithography interference system is often created with more complex multi-layered noble thin film geometries without graphene. However, this research includes a theoretical investigation of localized electric field enhancement for plasmonic nano-imaging via graphene-based heterogeneous U-shaped multi-nanogaps superlens by adjusting the graphene electron mechanism. It is determined that the plasmon system reaction in graphene thicknesses (⁓0.335nm and ⁓0.67nm) can be extraordinarily documented in the photoresist layer by modifying the thickness (layer) of thick graphene covering heterogeneous U-shaped multi-nanogaps superlens geometry. Moreover, it is described by means of the hybridization resulting in the alteration of the localized electric field enhancement within the graphene material-covered gold nanoimaging superlens. Ultimately, this theoretical investigation reveals that appropriate designing of optical superlens-based on graphene material can observe superior electric field enhancement for plasmons in low-priced , quality and simple nanoimaging for forward-looking plasmon-based applications of photolithography. such as drug delivery, Magnetic resonance imaging(MRI)