A method for controlling the crystallite size and growth rate of plasma-deposited diamond films. A plasma is established at a pressure in excess of about 55 Torr with controlled concentrations of hydrogen up to about 98% by volume, of unsubstituted hydrocarbons up to about 3% by volume and an inert gas of one or more of the noble gases and nitrogen up to about 98% by volume. The volume ratio of inert gas to hydrogen is preferably maintained at greater than about 4, to deposit a diamond film on a suitable substrate. The diamond film is deposited with a predetermined crystallite size and at a predetermined growth rate
Nanocrystalline diamond thin films have been prepared using hot filament CVD technique with a mixtur...
We present an overview of a nanocrystalline diamond (NCD) films deposition on silicon and glass subs...
The preparation of diamond layers and their (nano-) structures requires the optimization of several ...
A method of depositing nanocrystalline diamond film on a substrate at a rate of not less than about ...
A method and system for manufacturing nanocrystalline diamond film on a substrate such as field emis...
Nanocrystalline diamond films with different grain sizes were synthesized on Si substrate by the hot...
A method is provided for growing a diamond thin film on a selected substrate. First the substrate is...
A diamond film was synthesized by chemical vapor deposition, where a hot graphite plate was used to ...
A method and system for manufacturing diamond film. The method involves forming a carbonaceous vapor...
This article reports a process for preparing nanocrystalline diamond films by ion bombardment of dif...
Nanocrystalline diamond thin films have been prepared using hot filament CVD technique with a mixtur...
Diamond growth was carried out using various kinds of substrates and substrate holders in convention...
A method and system for manufacturing diamond film. The method involves forming a fullerene vapor, p...
Nanocrystalline diamond films have been deposited using a microwave plasma consisting of argon, 2--1...
Nanocrystalline diamond (NCD) thin films are being progressively more employed in different applicat...
Nanocrystalline diamond thin films have been prepared using hot filament CVD technique with a mixtur...
We present an overview of a nanocrystalline diamond (NCD) films deposition on silicon and glass subs...
The preparation of diamond layers and their (nano-) structures requires the optimization of several ...
A method of depositing nanocrystalline diamond film on a substrate at a rate of not less than about ...
A method and system for manufacturing nanocrystalline diamond film on a substrate such as field emis...
Nanocrystalline diamond films with different grain sizes were synthesized on Si substrate by the hot...
A method is provided for growing a diamond thin film on a selected substrate. First the substrate is...
A diamond film was synthesized by chemical vapor deposition, where a hot graphite plate was used to ...
A method and system for manufacturing diamond film. The method involves forming a carbonaceous vapor...
This article reports a process for preparing nanocrystalline diamond films by ion bombardment of dif...
Nanocrystalline diamond thin films have been prepared using hot filament CVD technique with a mixtur...
Diamond growth was carried out using various kinds of substrates and substrate holders in convention...
A method and system for manufacturing diamond film. The method involves forming a fullerene vapor, p...
Nanocrystalline diamond films have been deposited using a microwave plasma consisting of argon, 2--1...
Nanocrystalline diamond (NCD) thin films are being progressively more employed in different applicat...
Nanocrystalline diamond thin films have been prepared using hot filament CVD technique with a mixtur...
We present an overview of a nanocrystalline diamond (NCD) films deposition on silicon and glass subs...
The preparation of diamond layers and their (nano-) structures requires the optimization of several ...