The continued scaling of digital integrated circuits has led to an increasingly larger impact of process, supply voltage, and temperature (PVT) variations. The effect of these variations on logic cell and interconnect delays has introduced challenges to both circuit performance (timing)verification and optimization. In order for us to fully take advantage of the benefits of technology scaling, it is essential that ``variation-aware''techniques for performance verification and optimization be developed and used in modern design flows. In this thesis such techniques for both performance verification and optimization are presented. First, we present a fast method for finding the worst-case slacks over all process and environmental corne...
The move to deep submicron processes has brought about new problems that designers must contend with...
The effect of process variation is getting worse with every technology generation. With variability ...
With technology scaling, the variability of device parameters continues to increase. Both performanc...
The continued scaling of digital integrated circuits has led to an increasingly larger impact of pro...
This thesis focuses on random local delay variability measurement and its modeling. It explains a ci...
Driven by the need for faster devices and higher transistor densities, technology trends have pushed...
Driven by the need for faster devices and higher transistor densities, technology trends have pushed...
In this paper, a novel framework is introduced to estimate the max-delay variability in logic paths ...
Over the last few years, considerable variability in deep submicron integrated circuits has become a...
As device feature sizes shrink to nano-scale, continuous technology scaling has led to a large incre...
With the development of Very-Deep Sub-Micron technologies, process variability is becoming increasin...
Aggressive device scaling has made it imperative to account for process variations in the design flo...
With the continued and successful scaling of CMOS, process, voltage, and temperature (PVT), variati...
A physical yet compact gate delay model is developed integrating short-channel effects and the Alpha...
MasterThe variations of process parameters have increased due to the continued scaling down of semic...
The move to deep submicron processes has brought about new problems that designers must contend with...
The effect of process variation is getting worse with every technology generation. With variability ...
With technology scaling, the variability of device parameters continues to increase. Both performanc...
The continued scaling of digital integrated circuits has led to an increasingly larger impact of pro...
This thesis focuses on random local delay variability measurement and its modeling. It explains a ci...
Driven by the need for faster devices and higher transistor densities, technology trends have pushed...
Driven by the need for faster devices and higher transistor densities, technology trends have pushed...
In this paper, a novel framework is introduced to estimate the max-delay variability in logic paths ...
Over the last few years, considerable variability in deep submicron integrated circuits has become a...
As device feature sizes shrink to nano-scale, continuous technology scaling has led to a large incre...
With the development of Very-Deep Sub-Micron technologies, process variability is becoming increasin...
Aggressive device scaling has made it imperative to account for process variations in the design flo...
With the continued and successful scaling of CMOS, process, voltage, and temperature (PVT), variati...
A physical yet compact gate delay model is developed integrating short-channel effects and the Alpha...
MasterThe variations of process parameters have increased due to the continued scaling down of semic...
The move to deep submicron processes has brought about new problems that designers must contend with...
The effect of process variation is getting worse with every technology generation. With variability ...
With technology scaling, the variability of device parameters continues to increase. Both performanc...