Fabrication of Nickel Oxide Thin Films and Application thereof in Organic Electronics

This work investigates fabrication methods of nickel oxide thin films and their use in organic electronics. Two fabrication techniques were studied: UV-ozone oxidation of pure nickel films and reactive RF magnetron sputtering. The former was used to produce Ni/Ni2O3 bi-layer anodes to use as a substitute for the de facto standard ITO anode. OLEDs fabricated using Ni/Ni2O3 bi-layer anodes exhibited comparable device performance to standard ITO devices. UV-ozone oxidation was also used to fabricate Ni2O3 buffer layers for OPVs. Solar cells fabricated using Ni2O3 coated ITO exhibited an enhanced power conversion efficiency of up to 90%. RF magnetron sputtering was used to produce NiOx buffer layers with tunable conductivity and optical transparency for OPVs. Solar cells fabricated using NiOx coated ITO exhibited an enhanced power conversion efficiency of up to 60%. Nickel oxide films have been characterized with various techniques: sheet resistance measurements, optical transmission, XPS, UPS, AFM, and TEM.MAS