An electrochemical study of the open-circuit deposition of platinum on silicon from fluoride solutions is presented. The main features of the process can be explained using the mixed potential theory, in which the electrode potential is defined by two simultaneous reactions at the electrode surface: a cathodic reaction (platinum reduction and deposition) and an anodic reaction (silicon oxidation and dissolution). The charge is exchanged through the semiconducting substrate
A systematic study of the electrolysis of silver fluoride solutions has been made. The decompositi...
Electrodeposition of silicon on various electrode materials was investigated from a 1-butyl-3- methy...
The time dependence of the open circuit potential under oxygen and air is characterized by half-cell...
[eng] Metallic deposits can be produced on the surface of silicon crystals by immersion in aqueous s...
A method is presented for simultaneously producing porous silicon and depositing platinum on silicon...
There has been considerable interest in electrodeposition of silicon from fluoride melts on a suitab...
Electrodeposition of Fe, Pt and Fe–Pt on n-type Si (001) wafer was studied. The electrochemical nucl...
Semiconductor electrochemistry has known an important development in the eighties, especially aimed ...
The etching rate of silicon in fluoride-containing solutions was found to show a remarkable pH depen...
The present experience of the electrochemical dissolution of silicon and previous assumptions upon t...
The diploma thesis deals with researching electrodeposition of silicon in anhydrous solutions. As el...
In order to delineate n/p junctions at (100) or cleaved Si faces, different plating processes (elect...
Si anodic dissolution in acidic fluoride medium has been investigated in different regimes (porous s...
For the fabrication of ULSI circuits, the silicon surface should be free of metallic and particulate...
When Si is anodically oxidized in a fluoride containing electrolyte, an oxide layer is grown. Simult...
A systematic study of the electrolysis of silver fluoride solutions has been made. The decompositi...
Electrodeposition of silicon on various electrode materials was investigated from a 1-butyl-3- methy...
The time dependence of the open circuit potential under oxygen and air is characterized by half-cell...
[eng] Metallic deposits can be produced on the surface of silicon crystals by immersion in aqueous s...
A method is presented for simultaneously producing porous silicon and depositing platinum on silicon...
There has been considerable interest in electrodeposition of silicon from fluoride melts on a suitab...
Electrodeposition of Fe, Pt and Fe–Pt on n-type Si (001) wafer was studied. The electrochemical nucl...
Semiconductor electrochemistry has known an important development in the eighties, especially aimed ...
The etching rate of silicon in fluoride-containing solutions was found to show a remarkable pH depen...
The present experience of the electrochemical dissolution of silicon and previous assumptions upon t...
The diploma thesis deals with researching electrodeposition of silicon in anhydrous solutions. As el...
In order to delineate n/p junctions at (100) or cleaved Si faces, different plating processes (elect...
Si anodic dissolution in acidic fluoride medium has been investigated in different regimes (porous s...
For the fabrication of ULSI circuits, the silicon surface should be free of metallic and particulate...
When Si is anodically oxidized in a fluoride containing electrolyte, an oxide layer is grown. Simult...
A systematic study of the electrolysis of silver fluoride solutions has been made. The decompositi...
Electrodeposition of silicon on various electrode materials was investigated from a 1-butyl-3- methy...
The time dependence of the open circuit potential under oxygen and air is characterized by half-cell...