Wet etching on GaAs wafer at Institute of Electronics Clean Room facility

Our study involves the cleaning, wet etching, and characterization of GaAs wafer in the first semiconductor device fabrication laboratory at the Institute of Electronics, Atomic Energy Research Establishment. Our primary step is to develop necessary photolithography skill and thoroughly characterize equipment needed to perform photolithography including Hot plate, Spinner, Mask Aligner. Here, our studies are extended to photo resist thickness measurements using surface profiler and SEM to view etched surface quality. The experiences and the results of this study will benefit the students who are interested in the semiconductor fabrication field in Bangladesh