The mitigation of process variability becomes paramount as chip fabrication advances deeper into the sub-micron regime. Conservative guard-bands result in considerable performance loss, while most low-level solutions impede dynamic customization at application level. This paper exploits the existing process variability of commercial off-the-shelf FPGAs to improve the operating frequency of a design, in-the-field, at anytime during the lifetime of a chip. We begin by measuring variability in prevalent FPGAs and assessing its impact on the performance of common DSP benchmarks. For the former, we develop a custom sensing network of Ring-Oscillators to generate detailed 2D maps per chip. For the latter, we perform intensive testing and statisti...
Variation in performance and power across manufactured parts and their operating conditions is an ac...
Integrated circuit design is limited by manufacturability. As devices scale down, sensitivity to pro...
As integrated circuits are scaled down it becomes dif-ficult to maintain uniformity in process param...
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Compute...
As processor clock frequencies become faster, architecture-level design is becoming increasingly lim...
Process variability is a challenging fabrication issue impacting, mainly, the reliability and perfor...
Chip design in the nanometer regime is becoming increasingly difficult due to process variations. AS...
Abstract — We have fabricated an LUT-based FPGA device with functionalities measuring within-die var...
ABSTRACT Chip design in the nanometer regime is becoming increasingly difficult due to process varia...
The constant technology shrinking and the increasing demand for systems that operate under different...
Abstract—As semiconductor manufacturing continues towards reduced feature sizes, yield loss due to p...
Scaling of CMOS technology into the deep-submicron regime has made superior device performance and h...
Increasing variability in today's manufacturing processes causes parametric yield loss that increase...
Semiconductor technology has been scaling down at an exponential rate for many decades, yielding dra...
With the development of Very-Deep Sub-Micron technologies, process variability is becoming increasin...
Variation in performance and power across manufactured parts and their operating conditions is an ac...
Integrated circuit design is limited by manufacturability. As devices scale down, sensitivity to pro...
As integrated circuits are scaled down it becomes dif-ficult to maintain uniformity in process param...
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Compute...
As processor clock frequencies become faster, architecture-level design is becoming increasingly lim...
Process variability is a challenging fabrication issue impacting, mainly, the reliability and perfor...
Chip design in the nanometer regime is becoming increasingly difficult due to process variations. AS...
Abstract — We have fabricated an LUT-based FPGA device with functionalities measuring within-die var...
ABSTRACT Chip design in the nanometer regime is becoming increasingly difficult due to process varia...
The constant technology shrinking and the increasing demand for systems that operate under different...
Abstract—As semiconductor manufacturing continues towards reduced feature sizes, yield loss due to p...
Scaling of CMOS technology into the deep-submicron regime has made superior device performance and h...
Increasing variability in today's manufacturing processes causes parametric yield loss that increase...
Semiconductor technology has been scaling down at an exponential rate for many decades, yielding dra...
With the development of Very-Deep Sub-Micron technologies, process variability is becoming increasin...
Variation in performance and power across manufactured parts and their operating conditions is an ac...
Integrated circuit design is limited by manufacturability. As devices scale down, sensitivity to pro...
As integrated circuits are scaled down it becomes dif-ficult to maintain uniformity in process param...