NiO thin films have been synthesized by using chemical bath deposition method at various deposition times. The deposited films are further characterized for structural, morphological, optical and electrical properties by XRD, SEM, UV-Visible and two probe techniques respectively. The structural analysis carried out by XRD, shows polycrystalline nature of films with cubic crystal structure. The SEM images shows surface has porous structure with honeycomb like pores. Optical band gap NiO thin film founds to be 3.1 eV. The electrical resistivity of NiO thin films is of the order of 105 Ω-cm
Thin films of NiO have been prepared using potentiostatic electrodeposition technique from an aqueou...
Sol gel spin coating method has been successfully employed for the deposition of nanocrystalline nic...
Nickel oxide (NiO) is a versatile wide band gap semiconductor material. At present, transparent cond...
A simple and cheap chemical deposition method was used to produce a nickel oxide (NiO) thin film on ...
Nickel oxide (NiO) thin film has been deposited on a glass substrate at a temperature of 390˚C ± 10˚...
136-141Nanocrystalline thin films of nickel oxide (NiO) have been deposited on glass substrates in p...
Recently transparent conducting oxide thin films like nickel oxide are attracting more attention bec...
Thin films of the semiconductor NiO are deposited using a straightforward combination of simple and ...
Thin nickel oxide (NiO) films were deposited by the electron beam evaporation technique. The films ...
Nickel oxide thin films were prepared by spray pyrolysis, using nickel chloride as precursor at the ...
Nickel oxide(NiO)thin films were deposite donto glass substrates by the DC reactive magnetron sputte...
International audienceNickel oxide thin films were prepared by spray pyrolysis, using nickel chlorid...
International audienceNickel oxide thin films were prepared by spray pyrolysis, using nickel chlorid...
International audienceNickel oxide thin films were prepared by spray pyrolysis, using nickel chlorid...
Nickel oxide was deposited on highly cleaned glass substrates using spray pneumatic technique. The e...
Thin films of NiO have been prepared using potentiostatic electrodeposition technique from an aqueou...
Sol gel spin coating method has been successfully employed for the deposition of nanocrystalline nic...
Nickel oxide (NiO) is a versatile wide band gap semiconductor material. At present, transparent cond...
A simple and cheap chemical deposition method was used to produce a nickel oxide (NiO) thin film on ...
Nickel oxide (NiO) thin film has been deposited on a glass substrate at a temperature of 390˚C ± 10˚...
136-141Nanocrystalline thin films of nickel oxide (NiO) have been deposited on glass substrates in p...
Recently transparent conducting oxide thin films like nickel oxide are attracting more attention bec...
Thin films of the semiconductor NiO are deposited using a straightforward combination of simple and ...
Thin nickel oxide (NiO) films were deposited by the electron beam evaporation technique. The films ...
Nickel oxide thin films were prepared by spray pyrolysis, using nickel chloride as precursor at the ...
Nickel oxide(NiO)thin films were deposite donto glass substrates by the DC reactive magnetron sputte...
International audienceNickel oxide thin films were prepared by spray pyrolysis, using nickel chlorid...
International audienceNickel oxide thin films were prepared by spray pyrolysis, using nickel chlorid...
International audienceNickel oxide thin films were prepared by spray pyrolysis, using nickel chlorid...
Nickel oxide was deposited on highly cleaned glass substrates using spray pneumatic technique. The e...
Thin films of NiO have been prepared using potentiostatic electrodeposition technique from an aqueou...
Sol gel spin coating method has been successfully employed for the deposition of nanocrystalline nic...
Nickel oxide (NiO) is a versatile wide band gap semiconductor material. At present, transparent cond...