High-Power Impulse Magnetron Sputtering (HiPIMS) is an advanced coating technology that is currently being further developed for manufacturing superconducting radiofrequency cavities of particle accelerators. Although this technology offers numerous benefits compared to common coating techniques, the number of industrial applications is today still low. This leads to slow adoption of the technology, further developments and high costs of HiPIMS coatings. The aim of this project, therefore, is to identify and analyse potential application fields for HiPIMS to ultimately increase industrial adoption of this technology
High-power impulse magnetron sputtering (HiPIMS) is a promising sputtering-based ionized physical va...
The high degree of ionization of the sputtered material during the coating process is one of the mai...
In the last few years the interest of the thin film science and technology community on High Impulse...
High power impulse magnetron sputtering (HIPIMS) or high power pulse magnetron sputtering is a relat...
Starting with the introduction of planar magnetron cathodes in the mid seventies magnetron sputterin...
Recently material physics group at Science Institute of University of Iceland has been using reactiv...
High Power Pulsed Magnetron Sputtering (HIPIMS or HPPMS) is a magnetron sputtering technique that dr...
High Power Pulsed Magnetron Sputtering (HIPIMS or HPPMS) is a magnetron sputtering technique that dr...
High Power Pulsed Magnetron Sputtering (HIPIMS or HPPMS) is a magnetron sputtering technique that dr...
High Power Pulsed Magnetron Sputtering (HIPIMS or HPPMS) is a magnetron sputtering technique that dr...
In the last few years the interest of the thin film science and technology community on High Impulse...
The European Organization for Nuclear Research, known as CERN, is an international organization with...
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is ...
Niobium coatings on copper cavities have been considered as a cost-efficient replacement of bulk nio...
High Power Pulsed Magnetron Sputtering (HPPMS) or High Power Impulse Magnetron Sputtering (HiPIMS) i...
High-power impulse magnetron sputtering (HiPIMS) is a promising sputtering-based ionized physical va...
The high degree of ionization of the sputtered material during the coating process is one of the mai...
In the last few years the interest of the thin film science and technology community on High Impulse...
High power impulse magnetron sputtering (HIPIMS) or high power pulse magnetron sputtering is a relat...
Starting with the introduction of planar magnetron cathodes in the mid seventies magnetron sputterin...
Recently material physics group at Science Institute of University of Iceland has been using reactiv...
High Power Pulsed Magnetron Sputtering (HIPIMS or HPPMS) is a magnetron sputtering technique that dr...
High Power Pulsed Magnetron Sputtering (HIPIMS or HPPMS) is a magnetron sputtering technique that dr...
High Power Pulsed Magnetron Sputtering (HIPIMS or HPPMS) is a magnetron sputtering technique that dr...
High Power Pulsed Magnetron Sputtering (HIPIMS or HPPMS) is a magnetron sputtering technique that dr...
In the last few years the interest of the thin film science and technology community on High Impulse...
The European Organization for Nuclear Research, known as CERN, is an international organization with...
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is ...
Niobium coatings on copper cavities have been considered as a cost-efficient replacement of bulk nio...
High Power Pulsed Magnetron Sputtering (HPPMS) or High Power Impulse Magnetron Sputtering (HiPIMS) i...
High-power impulse magnetron sputtering (HiPIMS) is a promising sputtering-based ionized physical va...
The high degree of ionization of the sputtered material during the coating process is one of the mai...
In the last few years the interest of the thin film science and technology community on High Impulse...