Implementation of a High-Performance GaN-Based Light-Emitting Diode Grown on a Nanocomb-Shaped Patterned Sapphire Substrate

A GaN-based light-emitting diode (LED) grown on a nanocomb-shaped patterned sapphire substrate (PSS) is fabricated and studied. Nanocomb-shaped patterns are transferred on a sapphire substrate using a well-ordered anodized aluminum oxide (AAO) thin film as a mask for the inductively coupled plasma etching process. This well-ordered AAO thin film with a high aspect ratio is grown on a sapphire substrate by an oxalic acid-based electrochemical system and a three-step anodization. The strain state generated during epitaxial growth could be effectively alleviated by the use of nanocomb-shaped PSS. The treading dislocation density could be reduced. Thus, the enhanced crystalline quality is obtained. In addition, due to the presence of photonic crystal-like air buffer layer, part of reflected photons upward the top side could be scattered by this layer. Therefore, more photons could be extracted outside. Experimentally, at 20 mA, as compared with a conventional LED grown on a planar sapphire substrate, the studied LED grown on a nanocomb-shaped PSS shows 53.8% and 43.7% enhancements in light output power and external quantum efficiency as well as a reduced leakage current