In a wide variety of technology, thin films are of substantial importance to obtain high performance and reliability. Internal stresses in thin films may cause a loss of functionality. In order to control the internal stresses, first an accurate stress measurement is required. Multi beam optical stress sensor (MOSS) is an extremely reliable and sensitive system for in-situ real-time stress measurements. By measuring the curvature of a thin film substrate system, the film stress can be deduced by applying Stoney’s equation without knowledge of thin film material properties. Traditionally, a two-step method is used to calculate the curvature. First, the centroids of an array of parallel laser beams are fitted with Gaussian profiles. Secondly,...
Residual stress in YBCO films on Ag and Hastelloy C substrates was determined by using 3-D optical i...
Freestanding MEMS structures made of two long connected beams from different materials are fabricate...
A fully self-contained in-vacuum device for measuring thin film stress in situ is presented. The str...
In a wide variety of technology, thin films are of substantial importance to obtain high performance...
We introduce a novel methodology for the in-situ measurement of mechanical stress during thin film g...
A survey of thin films deposited by standard techniques (electrodeposition, chemical deposition, spu...
Residual stress measuring by optical methods has been proposed by several authors in the past years;...
Digital image processing is a useful tool that improves pictorial information for human interpretati...
We have developed a technique for measuring thin film stress during growth by monitoring the wafer c...
This paper discusses an experimental method to characterize thin films as they are encountered in mi...
Residual stress of as-deposited coatings may cause bending of the coating/substrate system. If resid...
-An optical system was developed to determine the stress profile of transparent thin films by measur...
Several methods have been developed since the early 1900 to extract thin film stresses from the curv...
The effectiveness of optical (mostly interferometric) methods for the measurement of residual stress...
The residual stress of thin films during the deposition process can cause the components to have unp...
Residual stress in YBCO films on Ag and Hastelloy C substrates was determined by using 3-D optical i...
Freestanding MEMS structures made of two long connected beams from different materials are fabricate...
A fully self-contained in-vacuum device for measuring thin film stress in situ is presented. The str...
In a wide variety of technology, thin films are of substantial importance to obtain high performance...
We introduce a novel methodology for the in-situ measurement of mechanical stress during thin film g...
A survey of thin films deposited by standard techniques (electrodeposition, chemical deposition, spu...
Residual stress measuring by optical methods has been proposed by several authors in the past years;...
Digital image processing is a useful tool that improves pictorial information for human interpretati...
We have developed a technique for measuring thin film stress during growth by monitoring the wafer c...
This paper discusses an experimental method to characterize thin films as they are encountered in mi...
Residual stress of as-deposited coatings may cause bending of the coating/substrate system. If resid...
-An optical system was developed to determine the stress profile of transparent thin films by measur...
Several methods have been developed since the early 1900 to extract thin film stresses from the curv...
The effectiveness of optical (mostly interferometric) methods for the measurement of residual stress...
The residual stress of thin films during the deposition process can cause the components to have unp...
Residual stress in YBCO films on Ag and Hastelloy C substrates was determined by using 3-D optical i...
Freestanding MEMS structures made of two long connected beams from different materials are fabricate...
A fully self-contained in-vacuum device for measuring thin film stress in situ is presented. The str...