Add to ORKGIn the semiconductor industry, a wafer stepper is used to expose the pattern on a mask (‘reticle’) onto a wafer. Accurate positioning of the reticle and the wafer is of crucial importance for creating a working IC. This paper reflects on the stage dynamics and control design in Stepper technology, introduces the modifications needed to successfully implement Scanner technology, and shows the further improvements in dualstage TWINSCAN systems
This paper is about interfacing a stepper motor to a microcontroller-based board which is programmed...
This article describes the basic optical principles in the lithographic tool, with the resulting pos...
Characterization of a GCA 4800 stepper was done in order to assess the system capability for image q...
In the semiconductor industry, a wafer stepper is used to expose the pattern on a mask (‘reticle’) o...
In IC manufacturing, lithographic scanners expose a circuit pattern onto a semiconductor wafer by me...
In this tutorial paper, control design aspects of wafer scanners used in the semiconductor industry ...
For step and scan lithography systems, the synchronization of reticle stage and wafer stage during e...
This paper discusses the approximation and feedback relevant parametric identification of a position...
Advances in photolithography are one of the key driving factors in the continuing expansion in capac...
Abstract—This paper presents a new run-to-run control scheme to reduce overlay misalignment errors i...
We describe algorithms for the determination of fast movement strategies for a step-and-scan wafer s...
The operation time of an ideal reliable wafer scanner model is defined at the die level where the ac...
Synchronization in lithographic wafer scanners involves a wafer-to-reticle stage controller. However...
Thesis (Ph.D.)--University of Washington, 2015This research addresses a fundamental problem using st...
This paper is about interfacing a stepper motor to a microcontroller-based board which is programmed...
This article describes the basic optical principles in the lithographic tool, with the resulting pos...
Characterization of a GCA 4800 stepper was done in order to assess the system capability for image q...
In the semiconductor industry, a wafer stepper is used to expose the pattern on a mask (‘reticle’) o...
In IC manufacturing, lithographic scanners expose a circuit pattern onto a semiconductor wafer by me...
In this tutorial paper, control design aspects of wafer scanners used in the semiconductor industry ...
For step and scan lithography systems, the synchronization of reticle stage and wafer stage during e...
This paper discusses the approximation and feedback relevant parametric identification of a position...
Advances in photolithography are one of the key driving factors in the continuing expansion in capac...
Abstract—This paper presents a new run-to-run control scheme to reduce overlay misalignment errors i...
We describe algorithms for the determination of fast movement strategies for a step-and-scan wafer s...
The operation time of an ideal reliable wafer scanner model is defined at the die level where the ac...
Synchronization in lithographic wafer scanners involves a wafer-to-reticle stage controller. However...
Thesis (Ph.D.)--University of Washington, 2015This research addresses a fundamental problem using st...
This paper is about interfacing a stepper motor to a microcontroller-based board which is programmed...
This article describes the basic optical principles in the lithographic tool, with the resulting pos...
Characterization of a GCA 4800 stepper was done in order to assess the system capability for image q...