High-brightness ion sources are important for several applications such as focussed ion beam (FIB) systems, in which an ion beam is focussed on a sample to a spot size of a few nanometer. These systems have become an important tool in a wide array of material science and technological applications because they offer both high-resolution imaging as well as micromachining capabilities. The resolution in the most common FIB system, the Gallium-Liquid Metal Ion Source (Ga-LMIS) based FIB, is limited by chromatic aberrations in the lens column due to the energy spread of o2 eV. To reach a higher resolution, a high-brightness ion source is needed with a lower energy spread. In this thesis such a new source is presented, the ultra-cold ion source ...