Hard graphitelike hydrogenated amorphous carbon with distinct infrared absorption spectra in the C–Hx stretching region is reported. These spectra are characterized by two separated peaks corresponding predominantly to sp3 CH and sp2 CH stretching modes and reveal a distinct absence of endgroups (sp2 CH2 and sp3 CH3). The relatively dense films (~2.1 g/cm3) have low hydrogen content (~20%), high refractive index (~2.4 at 3 µm), nanohardness exceeding 16 GPa, and a characteristic optical dispersion relation. These films are deposited at growth rates >15 nm/s, in the absence of high-energy ion bombardment, indicating the importance of the specific Ar–C2H2 chemistry of the remote plasma used
Diamondlike amorphous hydogenated carbon (a-C:H) films have found widespread use as hard coatings fo...
The aim of this article is to determine the role of carbon atoms in the growth of hydrogenated amorp...
Plasma deposition and properties of a-C:H are reviewed and recent results on the process characteriz...
Hard graphitelike hydrogenated amorphous carbon with distinct infrared absorption spectra in the C–H...
Hard graphitelike hydrogenated amorphous carbon with distinct infrared absorption spectra in the C–H...
Amorphous hydrogenated carbon films have been deposited on crystalline silicon and on glass from an ...
An improved plasma beam deposition set-up, based on an expanding thermal plasma, is presented. Amorp...
With a recently constructed deposition set-up, based on the expanding thermal plasma technique, amor...
Plasma deposition and properties of a-C:H are reviewed. The role of process gas, plasma chemistry an...
Amorphous hydrogenated carbon films (a-C:H) have been deposited using 193-nm ArF laserinduced photol...
Hydrogenated amorphous carbon (a-C:H) deposited from an Ar-C2H2 expanding thermal plasma chemical va...
Carbon films have been deposited by rf plasma decomposition of methane at 50-1400V negative bias and...
An overview is given on the deposition, properties and applications of dense amorphous carbon films ...
In this study, we have employed infrared (IR) absorption spectroscopy, visible Raman spectroscopy, a...
Amorphous hydrogenated carbon (a-C:H) films were prepared by plasma enhanced chemical vapor depositi...
Diamondlike amorphous hydogenated carbon (a-C:H) films have found widespread use as hard coatings fo...
The aim of this article is to determine the role of carbon atoms in the growth of hydrogenated amorp...
Plasma deposition and properties of a-C:H are reviewed and recent results on the process characteriz...
Hard graphitelike hydrogenated amorphous carbon with distinct infrared absorption spectra in the C–H...
Hard graphitelike hydrogenated amorphous carbon with distinct infrared absorption spectra in the C–H...
Amorphous hydrogenated carbon films have been deposited on crystalline silicon and on glass from an ...
An improved plasma beam deposition set-up, based on an expanding thermal plasma, is presented. Amorp...
With a recently constructed deposition set-up, based on the expanding thermal plasma technique, amor...
Plasma deposition and properties of a-C:H are reviewed. The role of process gas, plasma chemistry an...
Amorphous hydrogenated carbon films (a-C:H) have been deposited using 193-nm ArF laserinduced photol...
Hydrogenated amorphous carbon (a-C:H) deposited from an Ar-C2H2 expanding thermal plasma chemical va...
Carbon films have been deposited by rf plasma decomposition of methane at 50-1400V negative bias and...
An overview is given on the deposition, properties and applications of dense amorphous carbon films ...
In this study, we have employed infrared (IR) absorption spectroscopy, visible Raman spectroscopy, a...
Amorphous hydrogenated carbon (a-C:H) films were prepared by plasma enhanced chemical vapor depositi...
Diamondlike amorphous hydogenated carbon (a-C:H) films have found widespread use as hard coatings fo...
The aim of this article is to determine the role of carbon atoms in the growth of hydrogenated amorp...
Plasma deposition and properties of a-C:H are reviewed and recent results on the process characteriz...