Add to ORKGThe kinetics and mechanism of the title processes are discussed on the basis of a model in which the plasma-surface system is subdivided into 5 regions: (I) plasma prodn., (II) plasma flow plus radicals, (III) gas adsorbed layer, (IV) modified surface, and (V) undisturbed solid (or liq.) state. Emphasis is place on the first 2 regions in relation to the 3rd. The discussion is illustrated with measured plasma data for etching of SiO2 with CF4-Ar plasma mixts. and the deposition of C layers with CH4-Ar-H2 plasma
A review with 32 refs. is given on plasma deposition with an emphasis on surface processes. The plas...
A review with 32 refs. is given on plasma deposition with an emphasis on surface processes. The plas...
A review with 32 refs. is given on plasma deposition with an emphasis on surface processes. The plas...
The kinetics and mechanism of the title processes are discussed on the basis of a model in which the...
In the past few years, the physics of low temperature plasmas has received a new stimulus from appli...
In the past few years, the physics of low temperature plasmas has received a new stimulus from appli...
The growing field of applications of plasma as deposition, etching, surface modification and chemica...
The growing field of applications of plasma as deposition, etching, surface modification and chemica...
The growing field of applications of plasma as deposition, etching, surface modification and chemica...
The growing field of applications of plasma as deposition, etching, surface modification and chemica...
The growing field of applications of plasma as deposition, etching, surface modification and chemica...
A review with 29 refs. focused on the deposition of Si films and thin films of amorphous hydrogenate...
A review with 29 refs. focused on the deposition of Si films and thin films of amorphous hydrogenate...
A plane-parallel electrode discharge device, operating with CF4 at 0.05-0.5 torr, 13.5 MHz, and inpu...
The growing field of applications of plasma as deposition, etching, surface modification and chemica...
A review with 32 refs. is given on plasma deposition with an emphasis on surface processes. The plas...
A review with 32 refs. is given on plasma deposition with an emphasis on surface processes. The plas...
A review with 32 refs. is given on plasma deposition with an emphasis on surface processes. The plas...
The kinetics and mechanism of the title processes are discussed on the basis of a model in which the...
In the past few years, the physics of low temperature plasmas has received a new stimulus from appli...
In the past few years, the physics of low temperature plasmas has received a new stimulus from appli...
The growing field of applications of plasma as deposition, etching, surface modification and chemica...
The growing field of applications of plasma as deposition, etching, surface modification and chemica...
The growing field of applications of plasma as deposition, etching, surface modification and chemica...
The growing field of applications of plasma as deposition, etching, surface modification and chemica...
The growing field of applications of plasma as deposition, etching, surface modification and chemica...
A review with 29 refs. focused on the deposition of Si films and thin films of amorphous hydrogenate...
A review with 29 refs. focused on the deposition of Si films and thin films of amorphous hydrogenate...
A plane-parallel electrode discharge device, operating with CF4 at 0.05-0.5 torr, 13.5 MHz, and inpu...
The growing field of applications of plasma as deposition, etching, surface modification and chemica...
A review with 32 refs. is given on plasma deposition with an emphasis on surface processes. The plas...
A review with 32 refs. is given on plasma deposition with an emphasis on surface processes. The plas...
A review with 32 refs. is given on plasma deposition with an emphasis on surface processes. The plas...