A compilation of exptl. detd. surface ionization values for Al Ka and Pd La radiation on a wide variety of substrates, ranging from beryllium to bismuth, and measured between 4 and 30 kV, is presented. The values were extd. from the previously reported thin-film measurements on aluminum and palladium films by electron probe microanal. The j(0) values were detd. by establishing the ratios of the intensities emitted from the supported and unsupported films for six film thicknesses and extrapolating towards a film thickness approaching zero. Some 180 j(0) data each for Al Ka and Pd La x-radiation were collected in this way. The purpose of this work was to provide systematic data on which the numerous existing expressions for j(0) could be test...
Electron probe microanalysis is discussed as a versatile technique of near-surface chemical characte...
AbstractThe ongoing development of Atomic Layer Deposition (ALD) enables the use of relatively inexp...
The thickness of thin films of platinum and nickel on fused silica and silicon substrates has been d...
A compilation of exptl. detd. surface ionization values for Al Ka and Pd La radiation on a wide vari...
An exptl. procedure is described for measuring the surface ionization values j(o) using thin-film me...
We report new measurements of the surface ionization Phi(0) for Ge K alpha and L alpha X-rays on an ...
In succession to the authors' work on Al films a systematic database of thin-film measurements on Pd...
A systematic database of thin-film measurements on aluminum films by electron probe microanal. is pr...
Des couches minces de plus de 0,2 µm d'épaisseur sont déterminés par les méthodes établies pour l'ét...
Des couches minces de l'ordre de 200 µg/cm2, obtenues par évaporation et pulvérisation ont été étudi...
The basic principles of X-ray microanalysis of thin surface films and stratified targets are summari...
Theoretical methods to compute accurate x-ray spectra emitted from targets bombarded with kV electro...
A surface analysis facility using characteristic X-ray production following gas ion bombardment has ...
International audienceXFILM is a computer program for determining the thickness and composition of t...
The ongoing development of Atomic Layer Deposition (ALD) enables the use of relatively inexpensive a...
Electron probe microanalysis is discussed as a versatile technique of near-surface chemical characte...
AbstractThe ongoing development of Atomic Layer Deposition (ALD) enables the use of relatively inexp...
The thickness of thin films of platinum and nickel on fused silica and silicon substrates has been d...
A compilation of exptl. detd. surface ionization values for Al Ka and Pd La radiation on a wide vari...
An exptl. procedure is described for measuring the surface ionization values j(o) using thin-film me...
We report new measurements of the surface ionization Phi(0) for Ge K alpha and L alpha X-rays on an ...
In succession to the authors' work on Al films a systematic database of thin-film measurements on Pd...
A systematic database of thin-film measurements on aluminum films by electron probe microanal. is pr...
Des couches minces de plus de 0,2 µm d'épaisseur sont déterminés par les méthodes établies pour l'ét...
Des couches minces de l'ordre de 200 µg/cm2, obtenues par évaporation et pulvérisation ont été étudi...
The basic principles of X-ray microanalysis of thin surface films and stratified targets are summari...
Theoretical methods to compute accurate x-ray spectra emitted from targets bombarded with kV electro...
A surface analysis facility using characteristic X-ray production following gas ion bombardment has ...
International audienceXFILM is a computer program for determining the thickness and composition of t...
The ongoing development of Atomic Layer Deposition (ALD) enables the use of relatively inexpensive a...
Electron probe microanalysis is discussed as a versatile technique of near-surface chemical characte...
AbstractThe ongoing development of Atomic Layer Deposition (ALD) enables the use of relatively inexp...
The thickness of thin films of platinum and nickel on fused silica and silicon substrates has been d...