Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: II. Ar/N2 plasma with graphite nozzle

Amorphous hydrogenated carbon nitride films deposited via an expanding thermal plasma at high growth rates

Graaf, de, A.
Dinescu, G.
Longueville, J.L.
Sanden, van de, M.C.M.
Schram, D.C.
Kempeneer, E.H.A.
IJzendoorn, van, L.J.

January 1998

An expanding thermal plasma of argon and nitrogen into which acetylene is injected, was used to depo...

Effect of nitrogen surrounding gas and plasma assistance on nitrogen incorporation in a-C:N films by femtosecond pulsed laser deposition

Bourquard, Florent
Maddi, Chiranjeevi
Donnet, Christophe
Loir, A.-S.
Barnier, Vincent
Wolski, Krzysztof
Garrelie, Florence

June 2016

International audienceIn the context of nitrogen-rich amorphous carbon thin films ultrafast pulsed l...

Study of carbon nitride synthesis and deposition by reactive laser ablatio of graphite in low-pressure nitrogen atmosphere

M. L. DE GIORGI
G. LEGGIERI
A. LUCHES
A. PERRONE
A. ZOCCO
J. ZEMEK
M. TRCHOVA
BARUCCA, Gianni
MENGUCCI, Paolo

January 1998

Carbon nitride films were deposited on 〈111〉 Si substrates by XeCl laser ablation of graphite in low...

Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: II. Ar/N2 plasma with graphite nozzle

Graaf, de, A.
Aldea, E.
Dinescu, G.
Sanden, van de, M.C.M.

January 2001

The chemistry of an argon/nitrogen thermal plasma expanding through a graphite nozzle is investigate...

Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: I. Ar/N2/C2H2 plasma

Dinescu, G.
Graaf, de, A.
Aldea, E.
Sanden, van de, M.C.M.

January 2001

The chemistry of argon, argon/nitrogen and argon/nitrogen/acetylene expanding thermal plasmas is inv...

CN radical production and excitation in a thermal Ar/N2 plasma expanding through a graphite nozzle

Graaf, de, A.
van Deurzen, P.D.J.
Sanden, van de, M.C.M.
Schram, D.C.
Aldea, E.
Dinescu, G.
Pisarczyk, P.
Pisarczyk, J.
Wolowski, J.

January 1999

The use of an Expanding Thermal Plasma (ETP) generated by a cascaded arc for deposition of hydrogen-...

Optical emission spectroscopy on Ar/N/sub 2/ and Ar/N/sub 2//C/sub 2/H/sub 2/ expanding thermal plasmas

Graaf, A Ariël de
Sanden, MCM Richard van de
Schram, DC Daan
Aldea, E Eugen
Dinescu, G Gheorghe

January 1997

This work has been carried out in connection with the possibilities to deposit carbon nitride materi...

Amorphous hydrogenated carbon nitride films deposited via an expanding thermal plasma at high growth rates

Graaf, de, A.
Dinescu, G.
Longueville, J.L.
Sanden, van de, M.C.M.
Schram, D.C.
Kempeneer, E.H.A.
IJzendoorn, van, L.J.

January 1998

An expanding thermal plasma of argon and nitrogen into which acetylene is injected, was used to depo...

Effect of nitrogen surrounding gas and plasma assistance on nitrogen incorporation in a-C:N films by femtosecond pulsed laser deposition

Bourquard, Florent
Maddi, Chiranjeevi
Donnet, Christophe
Loir, A.-S.
Barnier, Vincent
Wolski, Krzysztof
Garrelie, Florence

June 2016

International audienceIn the context of nitrogen-rich amorphous carbon thin films ultrafast pulsed l...

Study of carbon nitride synthesis and deposition by reactive laser ablatio of graphite in low-pressure nitrogen atmosphere

M. L. DE GIORGI
G. LEGGIERI
A. LUCHES
A. PERRONE
A. ZOCCO
J. ZEMEK
M. TRCHOVA
BARUCCA, Gianni
MENGUCCI, Paolo

January 1998

Carbon nitride films were deposited on 〈111〉 Si substrates by XeCl laser ablation of graphite in low...

Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: II. Ar/N2 plasma with graphite nozzle

Graaf, de, A.
Aldea, E.
Dinescu, G.
Sanden, van de, M.C.M.

January 2001

The chemistry of an argon/nitrogen thermal plasma expanding through a graphite nozzle is investigate...

Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: I. Ar/N2/C2H2 plasma

Dinescu, G.
Graaf, de, A.
Aldea, E.
Sanden, van de, M.C.M.

January 2001

The chemistry of argon, argon/nitrogen and argon/nitrogen/acetylene expanding thermal plasmas is inv...

CN radical production and excitation in a thermal Ar/N2 plasma expanding through a graphite nozzle

Graaf, de, A.
van Deurzen, P.D.J.
Sanden, van de, M.C.M.
Schram, D.C.
Aldea, E.
Dinescu, G.
Pisarczyk, P.
Pisarczyk, J.
Wolowski, J.

January 1999

The use of an Expanding Thermal Plasma (ETP) generated by a cascaded arc for deposition of hydrogen-...

Optical emission spectroscopy on Ar/N/sub 2/ and Ar/N/sub 2//C/sub 2/H/sub 2/ expanding thermal plasmas

Graaf, A Ariël de
Sanden, MCM Richard van de
Schram, DC Daan
Aldea, E Eugen
Dinescu, G Gheorghe

January 1997

This work has been carried out in connection with the possibilities to deposit carbon nitride materi...

Amorphous hydrogenated carbon nitride films deposited via an expanding thermal plasma at high growth rates

Graaf, de, A.
Dinescu, G.
Longueville, J.L.
Sanden, van de, M.C.M.
Schram, D.C.
Kempeneer, E.H.A.
IJzendoorn, van, L.J.

January 1998

An expanding thermal plasma of argon and nitrogen into which acetylene is injected, was used to depo...

Effect of nitrogen surrounding gas and plasma assistance on nitrogen incorporation in a-C:N films by femtosecond pulsed laser deposition

Bourquard, Florent
Maddi, Chiranjeevi
Donnet, Christophe
Loir, A.-S.
Barnier, Vincent
Wolski, Krzysztof
Garrelie, Florence

June 2016

International audienceIn the context of nitrogen-rich amorphous carbon thin films ultrafast pulsed l...

Study of carbon nitride synthesis and deposition by reactive laser ablatio of graphite in low-pressure nitrogen atmosphere

M. L. DE GIORGI
G. LEGGIERI
A. LUCHES
A. PERRONE
A. ZOCCO
J. ZEMEK
M. TRCHOVA
BARUCCA, Gianni
MENGUCCI, Paolo

January 1998

Carbon nitride films were deposited on 〈111〉 Si substrates by XeCl laser ablation of graphite in low...

Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: II. Ar/N2 plasma with graphite nozzle

Abstract

Extracted data

Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: II. Ar/N2 plasma with graphite nozzle

Abstract

Extracted data

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