A general treatment of a diffusion-controlled growth of a stoichiometric intermetallic in reaction between two two-phase alloys is introduced. A reaction couple, in which a layer of Co2Si is formed during interdiffusion from its adjacent saturated phases is used as a model system. On the basis of chemical reaction equations occurring at the interphase interfaces, data on relative mobilities of diffusing species and the integrated diffusion coefficient in the product phase are deduced. The analysis yields numerical results identical to those calculated from classical Wagner's theory for the case in which the terminal phases of the diffusion couple are initially saturated
In this work the integrated diffusion coeff., Dint is used to get a kinetic description of the growt...
There have been number of efforts to develop a model that could be used to predict and to describe p...
The diffusion couple technique is a valuable experimental approach in studying phase relations in mu...
A general treatment of a diffusion-controlled growth of a stoichiometric intermetallic in reaction b...
A general treatment of a diffusion-controlled growth of a stoichiometric intermetallic in reaction b...
Diffusion couples, in which one single-phased layer of Co-silicide is growing from its saturated adj...
A diffusion-controlled growth of intermettalic phases and the role of the Kirkendall effect in morph...
A physico-chemical approach is developed, which can be used in binary diffusion couples to determine...
The relations for the growth and consumption rates of a layer with finite thickness as an end member...
Interdiffusion in hypothetical ternary single-phase and two-phase diffusion couples are examined usi...
Interdiffusion in hypothetical ternary single-phase and two-phase diffusion couples are examined usi...
The formation of intermetallic reaction layers was investigated for interdiffusion between a low car...
A mathematical model to describe the growth of silicides layers in metal - silicon diffusion couples...
In this work the integrated diffusion coeff., Dint is used to get a kinetic description of the growt...
There have been number of efforts to develop a model that could be used to predict and to describe p...
The diffusion couple technique is a valuable experimental approach in studying phase relations in mu...
A general treatment of a diffusion-controlled growth of a stoichiometric intermetallic in reaction b...
A general treatment of a diffusion-controlled growth of a stoichiometric intermetallic in reaction b...
Diffusion couples, in which one single-phased layer of Co-silicide is growing from its saturated adj...
A diffusion-controlled growth of intermettalic phases and the role of the Kirkendall effect in morph...
A physico-chemical approach is developed, which can be used in binary diffusion couples to determine...
The relations for the growth and consumption rates of a layer with finite thickness as an end member...
Interdiffusion in hypothetical ternary single-phase and two-phase diffusion couples are examined usi...
Interdiffusion in hypothetical ternary single-phase and two-phase diffusion couples are examined usi...
The formation of intermetallic reaction layers was investigated for interdiffusion between a low car...
A mathematical model to describe the growth of silicides layers in metal - silicon diffusion couples...
In this work the integrated diffusion coeff., Dint is used to get a kinetic description of the growt...
There have been number of efforts to develop a model that could be used to predict and to describe p...
The diffusion couple technique is a valuable experimental approach in studying phase relations in mu...