Growing demands in the semiconductor industry result in the need for enhanced performance of lithographic equipment. However, position tracking accuracy of high precision mechatronics is often limited by the presence of disturbance sources, which originate from unmodelled or unforeseen deterministic environmental effects. To negate the effects of these disturbances, a learning based feedforward controller is employed, where the underlying control policy is estimated from experimental data based on Gaussian Process regression. The proposed approach exploits the property of including prior knowledge on the expected steady state behaviour of residual dynamics in terms of kernel selection. Corresponding hyper-parameters are optimized using the ...