Nano-second laser interference photoembossed microstructures for enhanced cell alignment

  • Martínez, Alba
  • González-Lana, Sandra
  • Asín, Laura
  • de la Fuente, Jesús M.
  • Bastiaansen, Cees W.M.
  • Broer, Dirk J.
  • Sánchez-Somolinos, Carlos
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Publication date
August 2021
Language
English

Abstract

Photoembossing is a powerful photolithographic technique to prepare surface relief structures relying on polymerization-induced diffusion in a solventless development step. Conveniently, surface patterns are formed by two or more interfering laser beams without the need for a litho-graphic mask. The use of nanosecond pulsed light-based interference lithography strengthens the pattern resolution through the absence of vibrational line pattern distortions. Typically, a conventional photoembossing protocol consists of an exposure step at room temperature that is followed by a thermal development step at high temperature. In this work, we explore the possibility to perform the pulsed holographic exposure directly at the development temperature....

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