Topics
surface scienceBook
NetherlandsCountry
atomic layer depositionTopical concept
plasma sciencePopulated place
The usage of plasma as a reactant in atomic layer deposition processes started out as a niche process but in the meantime had its breakthrough in high-volume manufacturing in nano-electronics.Understanding the processes in plasma ALD is challenging but the knowledge in the Netherlands on plasma science, surface science and the ALD end-applications are a perfect foundation for a globally leading position in this field
Processing at the atomic scale is becoming increasingly critical for state-of-the-art electronic dev...
Processing at the atomic scale is becoming increasingly critical for state-of-the-art electronic dev...
Processing at the atomic scale is becoming increasingly critical for state-of-the-art electronic dev...
The usage of plasma as a reactant in atomic layer deposition processes started out as a niche proces...
Plasma atomic layer deposition (ALD) is optimized through modulation of the gas residence time durin...
Plasma atomic layer deposition (ALD) is optimized through modulation of the gas residence time durin...
Plasma atomic layer deposition (ALD) is optimized through modulation of the gas residence time durin...
Plasma-assisted atomic layer deposition (ALD) is an energy-enhanced method for the synthesis of ultr...
Plasma-assisted atomic layer deposition (ALD) is an energy-enhanced method for the synthesis of ultr...
Plasma-assisted atomic layer deposition (ALD) is an energy-enhanced method for the synthesis of ultr...
Plasma-assisted atomic layer deposition (ALD) is an energy-enhanced method for the synthesis of ultr...
Plasma-assisted atomic layer deposition (ALD) is an energy-enhanced method for the synthesis of ultr...
Atomic layer deposition (ALD) is a thin film deposition method based on alternating saturated surfac...
Atomic layer deposition (ALD) is a thin film deposition method based on alternating saturated surfac...
Processing at the atomic scale is becoming increasingly critical for state-of-the-art electronic dev...
Processing at the atomic scale is becoming increasingly critical for state-of-the-art electronic dev...
Processing at the atomic scale is becoming increasingly critical for state-of-the-art electronic dev...
Processing at the atomic scale is becoming increasingly critical for state-of-the-art electronic dev...
The usage of plasma as a reactant in atomic layer deposition processes started out as a niche proces...
Plasma atomic layer deposition (ALD) is optimized through modulation of the gas residence time durin...
Plasma atomic layer deposition (ALD) is optimized through modulation of the gas residence time durin...
Plasma atomic layer deposition (ALD) is optimized through modulation of the gas residence time durin...
Plasma-assisted atomic layer deposition (ALD) is an energy-enhanced method for the synthesis of ultr...
Plasma-assisted atomic layer deposition (ALD) is an energy-enhanced method for the synthesis of ultr...
Plasma-assisted atomic layer deposition (ALD) is an energy-enhanced method for the synthesis of ultr...
Plasma-assisted atomic layer deposition (ALD) is an energy-enhanced method for the synthesis of ultr...
Plasma-assisted atomic layer deposition (ALD) is an energy-enhanced method for the synthesis of ultr...
Atomic layer deposition (ALD) is a thin film deposition method based on alternating saturated surfac...
Atomic layer deposition (ALD) is a thin film deposition method based on alternating saturated surfac...
Processing at the atomic scale is becoming increasingly critical for state-of-the-art electronic dev...
Processing at the atomic scale is becoming increasingly critical for state-of-the-art electronic dev...
Processing at the atomic scale is becoming increasingly critical for state-of-the-art electronic dev...
Processing at the atomic scale is becoming increasingly critical for state-of-the-art electronic dev...
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