The accuracy with which film parameters can be determined from ellipsometric measurement data obtained at a limited number of incidence angles is analysed. The analysis is restricted to low loss films on transparent or slightly absorbing substrates. Further, a method is described for estimating the magnitude of random and systematic measurement errors. Results are experimentally verified for thermally grown oxide films on silicon substrate
Thesis (M.S.)--University of Rochester. College of Engineering and Applied Science. Institute of Opt...
Variable angle spectroscopic ellipsometry is a nondestructive technique for accurately determining t...
Ellipsometry is a nondestructive analysis technique for studying surfaces, interfaces and thin films...
The accuracy with which film parameters can be determined from ellipsometric measurement data obtain...
A nonlinear bounded-error estimation method is applied to the case of ellipsometric measurement of f...
A method is presented whereby the thickness and complex refractive index of a very think, partially ...
L'incertitude sur la mesure éllipsométrique de l'épaisseur d'un film sur un substrat peut être déter...
A procedure has been developed for the accurate measurement of film and substrate optical parameter...
International audienceSpectroscopic ellipsometry is a very sensitive optical metrology technique com...
A procedure for making A vs v plots to analyze ellipsometer readings was generated. This replaced th...
An innovative ellipsometer sample holder has been designed and tested in order to measure thin films...
The thickness of polymethylmethacrylate (PMMA) films deposited in solution on InP is measured by ell...
Graphical ellipsometric data reduction algorithm, based on independent analysis of both the real and...
Ellipsometry is a proven method for measuring layer thicknesses of flat, specularly reflective surfa...
Sensitivity and precision have been and continue to be considerations which have contributed to the ...
Thesis (M.S.)--University of Rochester. College of Engineering and Applied Science. Institute of Opt...
Variable angle spectroscopic ellipsometry is a nondestructive technique for accurately determining t...
Ellipsometry is a nondestructive analysis technique for studying surfaces, interfaces and thin films...
The accuracy with which film parameters can be determined from ellipsometric measurement data obtain...
A nonlinear bounded-error estimation method is applied to the case of ellipsometric measurement of f...
A method is presented whereby the thickness and complex refractive index of a very think, partially ...
L'incertitude sur la mesure éllipsométrique de l'épaisseur d'un film sur un substrat peut être déter...
A procedure has been developed for the accurate measurement of film and substrate optical parameter...
International audienceSpectroscopic ellipsometry is a very sensitive optical metrology technique com...
A procedure for making A vs v plots to analyze ellipsometer readings was generated. This replaced th...
An innovative ellipsometer sample holder has been designed and tested in order to measure thin films...
The thickness of polymethylmethacrylate (PMMA) films deposited in solution on InP is measured by ell...
Graphical ellipsometric data reduction algorithm, based on independent analysis of both the real and...
Ellipsometry is a proven method for measuring layer thicknesses of flat, specularly reflective surfa...
Sensitivity and precision have been and continue to be considerations which have contributed to the ...
Thesis (M.S.)--University of Rochester. College of Engineering and Applied Science. Institute of Opt...
Variable angle spectroscopic ellipsometry is a nondestructive technique for accurately determining t...
Ellipsometry is a nondestructive analysis technique for studying surfaces, interfaces and thin films...