We measured the electron density in an extreme ultra-violet (EUV) induced plasma. This is achieved in a low-pressure argon plasma by using a method called microwave cavity resonance spectroscopy. The measured electron density just after the EUV pulse is 2.6 × 1016 m-3. This is in good agreement with a theoretical prediction from photo-ionization, which yields a density of 4.5 × 1016 m-3. After the EUV pulse the density slightly increases due to electron impact ionization. The plasma (i.e. electron density) decays in tens of microseconds
Plasmas induced by EUV radiation are unique since they are created without the need of any discharge...
Plasmas induced by EUV radiation are unique since they are created without the need of any discharge...
Plasmas induced by EUV radiation are unique since they are created without the need of any discharge...
We measured the electron density in an extreme ultra-violet (EUV) induced plasma. This is achieved i...
We measured the electron density in an extreme ultra-violet (EUV) induced plasma. This is achieved i...
We measured the electron density in an extreme ultra-violet (EUV) induced plasma. This is achieved i...
We measured the electron density in an extreme ultra-violet (EUV) induced plasma. This is achieved i...
The new generation of lithography tools use high energy EUV radiation which ionizes the present back...
In order to meet the demand of increasing computer speed and memory capacity, industries are strivin...
In order to meet the demand of increasing computer speed and memory capacity, industries are strivin...
In order to meet the demand of increasing computer speed and memory capacity, industries are strivin...
In order to meet the demand of increasing computer speed and memory capacity, industries are strivin...
Plasmas induced by EUV radiation are unique since they are created without the need of any discharge...
\u3cp\u3ePlasmas induced by EUV radiation are unique since they are created without the need of any ...
Plasmas induced by EUV radiation are unique since they are created without the need of any discharge...
Plasmas induced by EUV radiation are unique since they are created without the need of any discharge...
Plasmas induced by EUV radiation are unique since they are created without the need of any discharge...
Plasmas induced by EUV radiation are unique since they are created without the need of any discharge...
We measured the electron density in an extreme ultra-violet (EUV) induced plasma. This is achieved i...
We measured the electron density in an extreme ultra-violet (EUV) induced plasma. This is achieved i...
We measured the electron density in an extreme ultra-violet (EUV) induced plasma. This is achieved i...
We measured the electron density in an extreme ultra-violet (EUV) induced plasma. This is achieved i...
The new generation of lithography tools use high energy EUV radiation which ionizes the present back...
In order to meet the demand of increasing computer speed and memory capacity, industries are strivin...
In order to meet the demand of increasing computer speed and memory capacity, industries are strivin...
In order to meet the demand of increasing computer speed and memory capacity, industries are strivin...
In order to meet the demand of increasing computer speed and memory capacity, industries are strivin...
Plasmas induced by EUV radiation are unique since they are created without the need of any discharge...
\u3cp\u3ePlasmas induced by EUV radiation are unique since they are created without the need of any ...
Plasmas induced by EUV radiation are unique since they are created without the need of any discharge...
Plasmas induced by EUV radiation are unique since they are created without the need of any discharge...
Plasmas induced by EUV radiation are unique since they are created without the need of any discharge...
Plasmas induced by EUV radiation are unique since they are created without the need of any discharge...