Results are presented of mask imaging using the Extended Nijboer-Zernike (ENZ) theory of diffraction. We show that the efficiency of a mask imaging algorithm, derived from this theory, can be increased. By adjusting the basic Finite Difference Time Domain (FDTD) algorithm, we can calculate the near field of isolated mask structures efficiently, without resorting to periodic domains. In addition, the calculations for the points on the entrance sphere of the imaging system can be done separately with a Fourier transformed Stratton-Chu near-to-far-field transformation. By clever sampling in the radial direction of the entrance pupil, the computational effort is already reduced by at least a factor of 4
Computational imaging is an emerging field. Its rapid development has drawn tremendous attention fro...
Rigorous electromagnetic field (EMF) simulation of light diffraction from optical lithography masks ...
The computational methods for the diffraction integrals that occur in the Extended Nijboer-Zernike (...
Results are presented of mask imaging using the Extended Nijboer-Zernike (ENZ) theory of diffraction...
Results are presented of mask imaging using the Extended Nijboer-Zernike (ENZ) theory of diffraction...
In this paper we introduce a new mask imaging algorithm that is based on the source point integratio...
We present details of a novel imaging algorithm based on the extended Nijboer-Zernike (ENZ) theory o...
We present details of a novel imaging algorithm based on the extended Nijboer–Zernike (ENZ) theory o...
In present-day society, we encounter optical systems on a daily basis. Most people have a DVD player...
We study the image formation by a high-numerical-aperture optical imaging system in the presence of ...
With a semi-analytical result from the Extended Nijboer-Zernike theory (which relates the Zernike mo...
In several optical systems, a specific Point Spread Function (PSF) needs to be generated. This can b...
As the opportunities for experimental studies are still limited, a predictive simulation of EUV lith...
A new and optimized electromagnetic field (EMF) solver based on the waveguide method with a decompos...
Computational imaging is an emerging field. Its rapid development has drawn tremendous attention fro...
Rigorous electromagnetic field (EMF) simulation of light diffraction from optical lithography masks ...
The computational methods for the diffraction integrals that occur in the Extended Nijboer-Zernike (...
Results are presented of mask imaging using the Extended Nijboer-Zernike (ENZ) theory of diffraction...
Results are presented of mask imaging using the Extended Nijboer-Zernike (ENZ) theory of diffraction...
In this paper we introduce a new mask imaging algorithm that is based on the source point integratio...
We present details of a novel imaging algorithm based on the extended Nijboer-Zernike (ENZ) theory o...
We present details of a novel imaging algorithm based on the extended Nijboer–Zernike (ENZ) theory o...
In present-day society, we encounter optical systems on a daily basis. Most people have a DVD player...
We study the image formation by a high-numerical-aperture optical imaging system in the presence of ...
With a semi-analytical result from the Extended Nijboer-Zernike theory (which relates the Zernike mo...
In several optical systems, a specific Point Spread Function (PSF) needs to be generated. This can b...
As the opportunities for experimental studies are still limited, a predictive simulation of EUV lith...
A new and optimized electromagnetic field (EMF) solver based on the waveguide method with a decompos...
Computational imaging is an emerging field. Its rapid development has drawn tremendous attention fro...
Rigorous electromagnetic field (EMF) simulation of light diffraction from optical lithography masks ...
The computational methods for the diffraction integrals that occur in the Extended Nijboer-Zernike (...