Add to ORKGWe have investigated Cl2-based inductively coupled plasma etching for fabrication of two-dimensional photonic crystals in the InP-based material system. The influence of temperature, ion current density and ion energy on etch rate and hole profile was studied. Nitrogen was added to the Cl2-chemistry for sidewall passivation to obtain vertical hole profile
An extensive investigation has been performed on inductively coupled plasma etching of InP. Animport...
An extensive investigation has been performed on inductively coupled plasma etching of InP. An impor...
An extensive investigation has been performed on inductively coupled plasma etching of InP. An impor...
We have investigated Cl2-based inductively coupled plasma etching for fabrication of two-dimensional...
An extensive investigation has been performed on inductively coupled plasma etching of InP. Animport...
An extensive investigation has been performed on inductively coupled plasma etching of InP. Animport...
An extensive investigation has been performed on inductively coupled plasma etching of InP. Animport...
An extensive investigation has been performed on inductively coupled plasma etching of InP. Animport...
We have developed an inductively coupled plasma etching process for fabrication of high-aspect-ratio...
We have developed an inductively coupled plasma etching process for fabrication of high-aspect-ratio...
We have developed an inductively coupled plasma etching process for fabrication of high-aspect-ratio...
We have developed an inductively coupled plasma etching process for fabrication of high-aspect-ratio...
We have developed an inductively coupled plasma etching process for fabrication of high-aspect-ratio...
We have investigated Cl2-based inductively coupled plasma etching for fabrication of two-dimensional...
An extensive investigation has been performed on inductively coupled plasma etching of InP. Animport...
An extensive investigation has been performed on inductively coupled plasma etching of InP. Animport...
An extensive investigation has been performed on inductively coupled plasma etching of InP. An impor...
An extensive investigation has been performed on inductively coupled plasma etching of InP. An impor...
We have investigated Cl2-based inductively coupled plasma etching for fabrication of two-dimensional...
An extensive investigation has been performed on inductively coupled plasma etching of InP. Animport...
An extensive investigation has been performed on inductively coupled plasma etching of InP. Animport...
An extensive investigation has been performed on inductively coupled plasma etching of InP. Animport...
An extensive investigation has been performed on inductively coupled plasma etching of InP. Animport...
We have developed an inductively coupled plasma etching process for fabrication of high-aspect-ratio...
We have developed an inductively coupled plasma etching process for fabrication of high-aspect-ratio...
We have developed an inductively coupled plasma etching process for fabrication of high-aspect-ratio...
We have developed an inductively coupled plasma etching process for fabrication of high-aspect-ratio...
We have developed an inductively coupled plasma etching process for fabrication of high-aspect-ratio...
We have investigated Cl2-based inductively coupled plasma etching for fabrication of two-dimensional...
An extensive investigation has been performed on inductively coupled plasma etching of InP. Animport...
An extensive investigation has been performed on inductively coupled plasma etching of InP. Animport...
An extensive investigation has been performed on inductively coupled plasma etching of InP. An impor...
An extensive investigation has been performed on inductively coupled plasma etching of InP. An impor...