Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: I. Ar/N2/C2H2 plasma

Plasma chemistry during the deposition of a-C:H films and its influence on film properties

Benedikt, J.
Woen, R.V.
Mensfoort, van, S.L.M.
Perina, V.
Hong, J.
Sanden, van de, M.C.M.

January 2003

Plasma chemistry in an argon/acetylene expanding thermal plasma was studied by means of a residual g...

Fast deposition of thin amorphous films using an expanding thermal plasma

Sanden, van de, M.C.M.
Gielen, J.W.A.M.
Severens, R.J.
Paffen, R.M.J.
Schram, D.C.

January 1996

The basic elements of expanding plasma beam deposition are explained. The principle of dissociation ...

Amorphous hydrogenated carbon films deposited with an expanding thermal plasma

Gielen, J.W.A.M.
Kleuskens, P.R.M.
Zande, van der, M.J.
Kiers, A.G.M.
Sanden, van de, M.C.M.
Schram, D.C.

January 1995

With a recently constructed deposition set-up, based on the expanding thermal plasma technique, amor...

Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: I. Ar/N2/C2H2 plasma

Dinescu, G.
Graaf, de, A.
Aldea, E.
Sanden, van de, M.C.M.

January 2001

The chemistry of argon, argon/nitrogen and argon/nitrogen/acetylene expanding thermal plasmas is inv...

Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: II. Ar/N2 plasma with graphite nozzle

Graaf, de, A.
Aldea, E.
Dinescu, G.
Sanden, van de, M.C.M.

January 2001

The chemistry of an argon/nitrogen thermal plasma expanding through a graphite nozzle is investigate...

Amorphous hydrogenated carbon nitride films deposited via an expanding thermal plasma at high growth rates

Graaf, de, A.
Dinescu, G.
Longueville, J.L.
Sanden, van de, M.C.M.
Schram, D.C.
Kempeneer, E.H.A.
IJzendoorn, van, L.J.

January 1998

An expanding thermal plasma of argon and nitrogen into which acetylene is injected, was used to depo...

Optical emission spectroscopy on Ar/N/sub 2/ and Ar/N/sub 2//C/sub 2/H/sub 2/ expanding thermal plasmas

Graaf, A Ariël de
Sanden, MCM Richard van de
Schram, DC Daan
Aldea, E Eugen
Dinescu, G Gheorghe

January 1997

This work has been carried out in connection with the possibilities to deposit carbon nitride materi...

CN radical production and excitation in a thermal Ar/N2 plasma expanding through a graphite nozzle

Graaf, de, A.
van Deurzen, P.D.J.
Sanden, van de, M.C.M.
Schram, D.C.
Aldea, E.
Dinescu, G.

January 1999

The use of an Expanding Thermal Plasma (ETP) generated by a cascaded arc for deposition of hydrogen-...

Plasma chemistry during the deposition of a-C:H films and its influence on film properties

Benedikt, J.
Woen, R.V.
Mensfoort, van, S.L.M.
Perina, V.
Hong, J.
Sanden, van de, M.C.M.

January 2003

Plasma chemistry in an argon/acetylene expanding thermal plasma was studied by means of a residual g...

Fast deposition of thin amorphous films using an expanding thermal plasma

Sanden, van de, M.C.M.
Gielen, J.W.A.M.
Severens, R.J.
Paffen, R.M.J.
Schram, D.C.

January 1996

The basic elements of expanding plasma beam deposition are explained. The principle of dissociation ...

Amorphous hydrogenated carbon films deposited with an expanding thermal plasma

Gielen, J.W.A.M.
Kleuskens, P.R.M.
Zande, van der, M.J.
Kiers, A.G.M.
Sanden, van de, M.C.M.
Schram, D.C.

January 1995

With a recently constructed deposition set-up, based on the expanding thermal plasma technique, amor...

Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: I. Ar/N2/C2H2 plasma

Dinescu, G.
Graaf, de, A.
Aldea, E.
Sanden, van de, M.C.M.

January 2001

The chemistry of argon, argon/nitrogen and argon/nitrogen/acetylene expanding thermal plasmas is inv...

Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: II. Ar/N2 plasma with graphite nozzle

Graaf, de, A.
Aldea, E.
Dinescu, G.
Sanden, van de, M.C.M.

January 2001

The chemistry of an argon/nitrogen thermal plasma expanding through a graphite nozzle is investigate...

Amorphous hydrogenated carbon nitride films deposited via an expanding thermal plasma at high growth rates

Graaf, de, A.
Dinescu, G.
Longueville, J.L.
Sanden, van de, M.C.M.
Schram, D.C.
Kempeneer, E.H.A.
IJzendoorn, van, L.J.

January 1998

An expanding thermal plasma of argon and nitrogen into which acetylene is injected, was used to depo...

Optical emission spectroscopy on Ar/N/sub 2/ and Ar/N/sub 2//C/sub 2/H/sub 2/ expanding thermal plasmas

Graaf, A Ariël de
Sanden, MCM Richard van de
Schram, DC Daan
Aldea, E Eugen
Dinescu, G Gheorghe

January 1997

This work has been carried out in connection with the possibilities to deposit carbon nitride materi...

CN radical production and excitation in a thermal Ar/N2 plasma expanding through a graphite nozzle

Graaf, de, A.
van Deurzen, P.D.J.
Sanden, van de, M.C.M.
Schram, D.C.
Aldea, E.
Dinescu, G.

January 1999

The use of an Expanding Thermal Plasma (ETP) generated by a cascaded arc for deposition of hydrogen-...

Plasma chemistry during the deposition of a-C:H films and its influence on film properties

Benedikt, J.
Woen, R.V.
Mensfoort, van, S.L.M.
Perina, V.
Hong, J.
Sanden, van de, M.C.M.

January 2003

Plasma chemistry in an argon/acetylene expanding thermal plasma was studied by means of a residual g...

Fast deposition of thin amorphous films using an expanding thermal plasma

Sanden, van de, M.C.M.
Gielen, J.W.A.M.
Severens, R.J.
Paffen, R.M.J.
Schram, D.C.

January 1996

The basic elements of expanding plasma beam deposition are explained. The principle of dissociation ...

Amorphous hydrogenated carbon films deposited with an expanding thermal plasma

Gielen, J.W.A.M.
Kleuskens, P.R.M.
Zande, van der, M.J.
Kiers, A.G.M.
Sanden, van de, M.C.M.
Schram, D.C.

January 1995

With a recently constructed deposition set-up, based on the expanding thermal plasma technique, amor...

Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: I. Ar/N2/C2H2 plasma

Abstract

Extracted data

Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: I. Ar/N2/C2H2 plasma

Abstract

Extracted data

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