For bonding silicon carbide optics, which require extreme stability, hydroxide catalysis bonding is considered [Rowan, S., Hough, J. and Elliffe, E., Silicon carbide bonding. UK Patent 040 7953.9, 2004. Please contact Mr. D. Whiteford for further information: ]. This technique is already used for bonding silicate-based materials, like fused silica and Zerodur. In application with silicon carbide, the technique is highly exptl. and the aim is to test the strength of the bond with silicon carbide. The silicon carbide is polished to l/10 PV flatness and then oxidized at 1100 DegC in a wet environment prior to bonding to form a necessary layer of SiO2 on the surface. The bonding is performed in clean room conditions. After bonding the pieces ar...
We apply the Hydroxide Catalysis Bonding (HCB) technique to phosphate glass and measure the reflecti...
This chapter provides an explanation to Silicon Direct Bonding. Direct bonding generally means joini...
Two combinations of oxidizing and etching agents, H2SO4:H2O2:HF and HNO3:HF, have been used to modif...
For bonding silicon carbide optics, which require extreme stability, hydroxide catalysis bonding is ...
In many optical and precision engineering applications, low thermal distortion materials need to be ...
Hydroxide catalysis bonding (HCB) as a jointing technique has been under development for astronomica...
Space-based optical systems must be made from lightweight materials which can withstand significant ...
Hydroxide catalysis bonding is a joining technique used in the construction of highly stable opto-me...
Surface treatments of silicon carbide have been investigated with the aim of improving the strength ...
Jointing materials is an inevitable step in the fabrication of many high performance optical devices...
AbstractSurface treatments of silicon carbide have been investigated with the aim of improving the s...
Silicon is under consideration as a substrate material for the mirror masses and quasi-monolithic su...
We apply the Hydroxide Catalysis Bonding (HCB) technique to phosphate glass and measure the reflecti...
SiC direct bonding using O2 plasma activation is investigated in this work. SiC substrate and n− SiC...
In this paper a new class of modified silicon direct bonding processes is presented. The new process...
We apply the Hydroxide Catalysis Bonding (HCB) technique to phosphate glass and measure the reflecti...
This chapter provides an explanation to Silicon Direct Bonding. Direct bonding generally means joini...
Two combinations of oxidizing and etching agents, H2SO4:H2O2:HF and HNO3:HF, have been used to modif...
For bonding silicon carbide optics, which require extreme stability, hydroxide catalysis bonding is ...
In many optical and precision engineering applications, low thermal distortion materials need to be ...
Hydroxide catalysis bonding (HCB) as a jointing technique has been under development for astronomica...
Space-based optical systems must be made from lightweight materials which can withstand significant ...
Hydroxide catalysis bonding is a joining technique used in the construction of highly stable opto-me...
Surface treatments of silicon carbide have been investigated with the aim of improving the strength ...
Jointing materials is an inevitable step in the fabrication of many high performance optical devices...
AbstractSurface treatments of silicon carbide have been investigated with the aim of improving the s...
Silicon is under consideration as a substrate material for the mirror masses and quasi-monolithic su...
We apply the Hydroxide Catalysis Bonding (HCB) technique to phosphate glass and measure the reflecti...
SiC direct bonding using O2 plasma activation is investigated in this work. SiC substrate and n− SiC...
In this paper a new class of modified silicon direct bonding processes is presented. The new process...
We apply the Hydroxide Catalysis Bonding (HCB) technique to phosphate glass and measure the reflecti...
This chapter provides an explanation to Silicon Direct Bonding. Direct bonding generally means joini...
Two combinations of oxidizing and etching agents, H2SO4:H2O2:HF and HNO3:HF, have been used to modif...