The growth of silicides in Ni-Si and Ni-SiC diffusion couples

In this work the integrated diffusion coeff., Dint is used to get a kinetic description of the growth of silicides in the Ni-Si and Ni-SiC diffusion couples. In both systems the same values were found for the Dint of the phases concerned. The position of the Kirkendall plane in the diffusion couples revealed that Ni is the only diffusing species in the phase Ni5Si2. [on SciFinder (R)