On the temperature dependence of the deposition rate of amorphous, hydrogenated carbon films

The temperature behavior of the deposition rate of amorphous, hydrogenated carbon films is analyzed both experimentally and theoretically. A reactor based on the supersonic expansion of an arc plasma is used. The film thickness is measured using in situ He–Ne ellipsometry. The surface temperature is measured with thermocouples. Comparison of the presented model with the experimental results suggests that the deposited atoms and radicals diffuse over the surface in a weakly bound, adsorbed layer before they are incorporated in the film. Direct incorporation upon chemisorption is improbable