The effect of chromatic aberration (CC) on the spatial resolution in transmission electron microscopy (TEM) was studied in thick specimens in which the sample becomes the limiting factor in the resolution. The sample influences the energy spread of the electron beam, allows only a limited electron dose, and modulates electron scattering events. The experimental set-up consisted of a thin silicon nitride membrane and a silicon wedge containing gold nanoparticles. The resolution was measured as a function of electron dose and sample thickness for different sample configurations and for different microscopy modalities including regular TEM, energy filtered TEM (EFTEM) and CC-corrected TEM. Comparison with an analytical model aided the understa...
Abstract Contrast-transfer calculations indicate that Cc correction should be highly beneficial for ...
The fundamental limitations on spatial resolution of X-ray microanalysis in the scanning transmissio...
One challenge existing since the invention of electron-beam lithography (EBL) is understanding the e...
Transmission electron microscopy is an indispensable tool in modern materials science. It enables th...
We have optimized a bright-field transmission electron microscope for imaging of high-resolution rad...
We have optimized a bright-field transmission electron microscope for imaging of high-resolution rad...
Electron radiation damage is an important topic in electron microscopy. A large proportion of materi...
We discuss various factors that determine the performance of electron energy-loss spectroscopy (EELS...
Transmission electron microscopy (TEM) at sub-Angstrom resolution is important for nanotechnology. I...
Transmission electron microscopy (TEM) at sub-Angstrom resolution is important for nanotechnology. ...
We have optimized a bright-field transmission electron microscope for imaging of high-resolution rad...
Quantitative investigations of material structures on an atomic scale by means of high-resolution tr...
Electron radiation damage is an important topic in electron microscopy. A large proportion of materi...
Aim of the project is the development of an electron optical element which allows for the correction...
Transmission electron microscopy is an extremely powerful technique for direct characterization of l...
Abstract Contrast-transfer calculations indicate that Cc correction should be highly beneficial for ...
The fundamental limitations on spatial resolution of X-ray microanalysis in the scanning transmissio...
One challenge existing since the invention of electron-beam lithography (EBL) is understanding the e...
Transmission electron microscopy is an indispensable tool in modern materials science. It enables th...
We have optimized a bright-field transmission electron microscope for imaging of high-resolution rad...
We have optimized a bright-field transmission electron microscope for imaging of high-resolution rad...
Electron radiation damage is an important topic in electron microscopy. A large proportion of materi...
We discuss various factors that determine the performance of electron energy-loss spectroscopy (EELS...
Transmission electron microscopy (TEM) at sub-Angstrom resolution is important for nanotechnology. I...
Transmission electron microscopy (TEM) at sub-Angstrom resolution is important for nanotechnology. ...
We have optimized a bright-field transmission electron microscope for imaging of high-resolution rad...
Quantitative investigations of material structures on an atomic scale by means of high-resolution tr...
Electron radiation damage is an important topic in electron microscopy. A large proportion of materi...
Aim of the project is the development of an electron optical element which allows for the correction...
Transmission electron microscopy is an extremely powerful technique for direct characterization of l...
Abstract Contrast-transfer calculations indicate that Cc correction should be highly beneficial for ...
The fundamental limitations on spatial resolution of X-ray microanalysis in the scanning transmissio...
One challenge existing since the invention of electron-beam lithography (EBL) is understanding the e...