Transition metal oxynitride films are receiving more attention due to their significant potential. Indeed, the combination of nitrogen and oxygen in coatings allows access to a wide field of materials with functional properties between oxide and nitride. The purpose of this work consists of completing the knowledge of this new class of material, especially of the Fe-O-N films. A wide range of chemical composition of Fe-O-N films has been elaborated by reactive sputtering. The oxygen was introduced either with a constant mass flow rate or periodically with exponential signals. The studies by XRD and by Mössbauer spectrometry allowed to separate the films in four classes according to their rate of oxygen: iron nitrides; iron oxynitrides which...
An original reactive sputtering method, namely the reactive gas pulsing process (RGPP) was developed...
Single-layered zirconium oxynitride (ZrNxOy) thin films have been deposited on steel substrates, at ...
The work performed during this thesis has investigated the influence of the initial oxidation mechan...
International audienceMultilayered Fe-O-N films were deposited on glass and silicon substrates using...
International audienceFe-O-N films were successfully deposited by magnetron sputtering of an iron ta...
International audienceIn this paper, the properties of iron oxynitride films prepared by magnetron s...
International audienceAn iron oxynitride film was deposited on silicon and glass substrates by magne...
[[abstract]]"Abstract This study concerns the use of reactive magnetron sputtering to prepare (TiVCr...
Zirconium oxynitride thin films were deposited by dc reactive magnetron sputtering. A zirconium meta...
The main purpose of this work consists on the preparation of single layered molybdenum oxynitride, M...
International audience• FeO films were synthesized by pulsed-DC magnetron sputtering from metallic t...
In this work the oxidation resistance of DC reactive sputtered niobium oxynitrides and its influence...
This work is devoted to the investigation of decorative zirconium oxynitride, ZrOxNy, films prepared...
Des films d’oxynitrures de fer ont été déposés sur différents substrats par pulvérisation magnétron ...
An original reactive sputtering method, namely the reactive gas pulsing process (RGPP) was developed...
Single-layered zirconium oxynitride (ZrNxOy) thin films have been deposited on steel substrates, at ...
The work performed during this thesis has investigated the influence of the initial oxidation mechan...
International audienceMultilayered Fe-O-N films were deposited on glass and silicon substrates using...
International audienceFe-O-N films were successfully deposited by magnetron sputtering of an iron ta...
International audienceIn this paper, the properties of iron oxynitride films prepared by magnetron s...
International audienceAn iron oxynitride film was deposited on silicon and glass substrates by magne...
[[abstract]]"Abstract This study concerns the use of reactive magnetron sputtering to prepare (TiVCr...
Zirconium oxynitride thin films were deposited by dc reactive magnetron sputtering. A zirconium meta...
The main purpose of this work consists on the preparation of single layered molybdenum oxynitride, M...
International audience• FeO films were synthesized by pulsed-DC magnetron sputtering from metallic t...
In this work the oxidation resistance of DC reactive sputtered niobium oxynitrides and its influence...
This work is devoted to the investigation of decorative zirconium oxynitride, ZrOxNy, films prepared...
Des films d’oxynitrures de fer ont été déposés sur différents substrats par pulvérisation magnétron ...
An original reactive sputtering method, namely the reactive gas pulsing process (RGPP) was developed...
Single-layered zirconium oxynitride (ZrNxOy) thin films have been deposited on steel substrates, at ...
The work performed during this thesis has investigated the influence of the initial oxidation mechan...