The description refers to an anisotropic etching process for the etching of semiconducting materials by means of electrochemical etching stop. It is suitable for the production of micromechanical devices. Through the use of an alkali metal ion-free etching medium, this process is suitable for use in cleanrooms and is compatible with the production methods in the semiconductor industry. Thus micromechanical devices and integrated circuits can be integrated adjacently on common semiconductor surfaces on an industrial scale
Anisotropic wet-chemical etching is a key technology in the fabrication of sensors and actuators bec...
Dry anisotropic etching of silicon is an important technology for fabrication of MEMS (micro-electro...
A process for the surface treatment of photosensitive compound semiconductors comprises an electroly...
The invention relates to a process for the anisotropic etching of monocrystalline materials. While a...
SIGLECopy held by FIZ Karlsruhe; available from UB/TIB Hannover / FIZ - Fachinformationszzentrum Kar...
SIGLECopy held by FIZ Karlsruhe; available from UB/TIB Hannover / FIZ - Fachinformationszzentrum Kar...
SIGLECopy held by FIZ Karlsruhe; available from UB/TIB Hannover / FIZ - Fachinformationszzentrum Kar...
SIGLEAvailable from TIB Hannover: RO 2656(413-91 PUB)ME / FIZ - Fachinformationszzentrum Karlsruhe /...
Embodiments of the invention relate to production methods. In a first step, a semiconductor substrat...
[[abstract]]Etching process is one of the key technologies for fabricating high aspect structures in...
Silicon micromachining (1), the generation of three-dimensional microstructures in silicon by planar...
Etching is the process of using an acidic or caustic chemical to cut into unprotected areas of a par...
The success of silicon IC technology in producing a wide variety of microstructures relies heavily o...
SIGLEAvailable from TIB Hannover: RO 2656(0368-91) / FIZ - Fachinformationszzentrum Karlsruhe / TIB ...
This dissertation is intended as a guidebook for processing crystalline silicon by anisotropic potas...
Anisotropic wet-chemical etching is a key technology in the fabrication of sensors and actuators bec...
Dry anisotropic etching of silicon is an important technology for fabrication of MEMS (micro-electro...
A process for the surface treatment of photosensitive compound semiconductors comprises an electroly...
The invention relates to a process for the anisotropic etching of monocrystalline materials. While a...
SIGLECopy held by FIZ Karlsruhe; available from UB/TIB Hannover / FIZ - Fachinformationszzentrum Kar...
SIGLECopy held by FIZ Karlsruhe; available from UB/TIB Hannover / FIZ - Fachinformationszzentrum Kar...
SIGLECopy held by FIZ Karlsruhe; available from UB/TIB Hannover / FIZ - Fachinformationszzentrum Kar...
SIGLEAvailable from TIB Hannover: RO 2656(413-91 PUB)ME / FIZ - Fachinformationszzentrum Karlsruhe /...
Embodiments of the invention relate to production methods. In a first step, a semiconductor substrat...
[[abstract]]Etching process is one of the key technologies for fabricating high aspect structures in...
Silicon micromachining (1), the generation of three-dimensional microstructures in silicon by planar...
Etching is the process of using an acidic or caustic chemical to cut into unprotected areas of a par...
The success of silicon IC technology in producing a wide variety of microstructures relies heavily o...
SIGLEAvailable from TIB Hannover: RO 2656(0368-91) / FIZ - Fachinformationszzentrum Karlsruhe / TIB ...
This dissertation is intended as a guidebook for processing crystalline silicon by anisotropic potas...
Anisotropic wet-chemical etching is a key technology in the fabrication of sensors and actuators bec...
Dry anisotropic etching of silicon is an important technology for fabrication of MEMS (micro-electro...
A process for the surface treatment of photosensitive compound semiconductors comprises an electroly...