The epitaxial growth of atomic systems, interacting via the spherically symmetric Lennard-Jones potential is studied as a function of substrate temperature Ts and deposition rate. The calculations reveal the microscopic structure of thin films, and give insight into the dynamics of the adsorption process. For all substrate temperatures the growth is into well ordered layers which become fully completed at intermediate Ts. At very low Ts the layers contain defects and voids; however, the atoms are still arranged in close-packed islands within the layers. It is shown that the films exhibit a pronounced columnar structure if deposited at low Ts
It is shown how the combination of atomic deposition and nonlinear diffusion may lead, below a criti...
Thin films are nanoscale layers of material used to functionalize surfaces or to serve as building b...
Thin films are nanoscale layers of material used to functionalize surfaces or to serve as building b...
Chemical vapor deposition is gradually emphasized as one promising method of nanomaterial formation....
We simulated a growth of metal films with two models of surface diffusion and investigated the relat...
[[abstract]]We investigate the heteroepitaxial growth of thin film deposited on a (001) substrate vi...
Molecular dynamics simulation was used to study the influence of a relative size of adsorbed and sub...
It is shown how that the combination of atomic deposition and nonlinear diffusion may lead, below a ...
The thin film growth has been confirmed to be assembled by an enormous number of clusters in experim...
We discuss the interplay between chemical ordering and surface roughening during molecular beam epit...
We discuss the interplay between chemical ordering and surface roughening during molecular beam epit...
We discuss the interplay between chemical ordering and surface roughening during molecular beam epit...
AbstractAtomic processes and structural configurations during thin film growth of silicon are studie...
Two‐dimensional, nonequilibrium molecular dynamics simulations have been applied to study the struct...
Thin films are nanoscale layers of material, with exotic properties useful in diverse areas, ranging...
It is shown how the combination of atomic deposition and nonlinear diffusion may lead, below a criti...
Thin films are nanoscale layers of material used to functionalize surfaces or to serve as building b...
Thin films are nanoscale layers of material used to functionalize surfaces or to serve as building b...
Chemical vapor deposition is gradually emphasized as one promising method of nanomaterial formation....
We simulated a growth of metal films with two models of surface diffusion and investigated the relat...
[[abstract]]We investigate the heteroepitaxial growth of thin film deposited on a (001) substrate vi...
Molecular dynamics simulation was used to study the influence of a relative size of adsorbed and sub...
It is shown how that the combination of atomic deposition and nonlinear diffusion may lead, below a ...
The thin film growth has been confirmed to be assembled by an enormous number of clusters in experim...
We discuss the interplay between chemical ordering and surface roughening during molecular beam epit...
We discuss the interplay between chemical ordering and surface roughening during molecular beam epit...
We discuss the interplay between chemical ordering and surface roughening during molecular beam epit...
AbstractAtomic processes and structural configurations during thin film growth of silicon are studie...
Two‐dimensional, nonequilibrium molecular dynamics simulations have been applied to study the struct...
Thin films are nanoscale layers of material, with exotic properties useful in diverse areas, ranging...
It is shown how the combination of atomic deposition and nonlinear diffusion may lead, below a criti...
Thin films are nanoscale layers of material used to functionalize surfaces or to serve as building b...
Thin films are nanoscale layers of material used to functionalize surfaces or to serve as building b...