A new tool SOLID (simulation of optical lithography in three dimensions) for simulation of optical projection printing is presented. This tool allows the computation of two-dimensional aerial images and uses a simple approach for calculation of the bulk image. Resist profiles determined through simulations and experimental results are compared
PROLITH/2, a tool for modelling and analyzing photolithographic processes, was used to explore two s...
Lithographic processes belong to the most critical steps in the fabrication of m icroelectronic circ...
A proximity effect simulation technique and developed resist profile simulation for variable-shaped ...
Simulation of lithographic processes in semiconductor manufacturing has gone from a crude learning t...
In general, simulation requires a thorough understanding of the physics and/or chemistry of the proc...
Simulation of lithographic processes in semiconductor manufacturing has gone from a crude learning t...
Simulation of photolithographic processes is widely used in semiconductor research and industry. The...
There is an increasing need for computer-aided lithography simulation and modelling in IC manufactur...
PROLITH/2, a tool for modelling and analyzing photolithographic processes, was used to explore two s...
This article reviews standard and advanced modeling techniques in lithography simulation. Rigorous e...
A simple and easy to apply model is presented for contact and proximity lithographic steps. A first ...
Image intensity profiles and resist profile calculations using the XMAS simulation program are prese...
The program XMAS, which allows the simulation of 3-D resist profiles in x-ray lithography has been u...
This paper presents an extended Abbe based imaging algorithm for faster and more accurate simulation...
Optical lithography has been the key enabling technology for scaling down dimensions of devices on V...
PROLITH/2, a tool for modelling and analyzing photolithographic processes, was used to explore two s...
Lithographic processes belong to the most critical steps in the fabrication of m icroelectronic circ...
A proximity effect simulation technique and developed resist profile simulation for variable-shaped ...
Simulation of lithographic processes in semiconductor manufacturing has gone from a crude learning t...
In general, simulation requires a thorough understanding of the physics and/or chemistry of the proc...
Simulation of lithographic processes in semiconductor manufacturing has gone from a crude learning t...
Simulation of photolithographic processes is widely used in semiconductor research and industry. The...
There is an increasing need for computer-aided lithography simulation and modelling in IC manufactur...
PROLITH/2, a tool for modelling and analyzing photolithographic processes, was used to explore two s...
This article reviews standard and advanced modeling techniques in lithography simulation. Rigorous e...
A simple and easy to apply model is presented for contact and proximity lithographic steps. A first ...
Image intensity profiles and resist profile calculations using the XMAS simulation program are prese...
The program XMAS, which allows the simulation of 3-D resist profiles in x-ray lithography has been u...
This paper presents an extended Abbe based imaging algorithm for faster and more accurate simulation...
Optical lithography has been the key enabling technology for scaling down dimensions of devices on V...
PROLITH/2, a tool for modelling and analyzing photolithographic processes, was used to explore two s...
Lithographic processes belong to the most critical steps in the fabrication of m icroelectronic circ...
A proximity effect simulation technique and developed resist profile simulation for variable-shaped ...
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