Film deposition by laser-arcs

This method of laser-induced vacuum arc evaporation includes advantages of the laser pulse vapour deposition (LPVD) technique and technologically utilized vacuum arc evaporation. It combines pulse deposition of LPVD with the high energy efficiency of a vacuum arc. An Nd:YAG laser beam is focused on a target having cathodic potential. This laser beam induces a plasma which initiates a vacuum arc discharge. First results for carbon and titanium film deposition are presented