A new process for realising three dimensional microstructures is presented. Using an UV lithographic process, patterning of thick resist layers was possible. Structures with high aspect ratios up to ten were performed. The fabricated resist patterns were moulded by an electroplated Fe/Ni alloy. For the deposition of smooth and homogeneous layers a pulse electroplating system was applied. During a second manufacturing process including resist coating, UV exposure, and electroplating, the next layer of the microstructure was formed. This procedure was repeated and if necessary an intermediate plating base was additionally deposited. Removing the resist and the plating bases, the fabrication of three dimensional metal structures was completed....
We investigated the combination of electroless and electrolytic plating of nickel, copper, and ferri...
If micromachines can be produced with metal microstructures, their application field will be greatly...
Metallic micro devices have advantages over silicon-based microdevices when subjected to high stress...
A new process for realising three dimensional microstructures is presented. Using an UV lithographic...
A new technology called 3D UV-microforming consisting of an advanced resist preparation process, UV ...
Very thick photoresist layers were patterned by contact ultraviolet (UV) lithography. In a following...
Among the many different fabrication techniques of microsystem technology, surface micromachining is...
The invention relates to a process for the production of a three-dimensional component or a componen...
A fabrication process for 3D ferromagnetic micro patterns of an Fe/Ni alloy, based on conventional U...
There is growing interest in the development of fabrication techniques to cost effectively mass-prod...
We report a fabrication approach for three-dimensional (3-D) microstructures having functional metal...
Electrodeposition of photoresist on highly structured surfaces is combined with electroplating to fa...
A new microfabrication technology capable of electro-depositing truly three dimensional metal micro-...
Two concepts for use in the fabrication of three-dimensional (3D) microstructures with complex topol...
The development of microsystem technology has initiated various types of microfabrication processes....
We investigated the combination of electroless and electrolytic plating of nickel, copper, and ferri...
If micromachines can be produced with metal microstructures, their application field will be greatly...
Metallic micro devices have advantages over silicon-based microdevices when subjected to high stress...
A new process for realising three dimensional microstructures is presented. Using an UV lithographic...
A new technology called 3D UV-microforming consisting of an advanced resist preparation process, UV ...
Very thick photoresist layers were patterned by contact ultraviolet (UV) lithography. In a following...
Among the many different fabrication techniques of microsystem technology, surface micromachining is...
The invention relates to a process for the production of a three-dimensional component or a componen...
A fabrication process for 3D ferromagnetic micro patterns of an Fe/Ni alloy, based on conventional U...
There is growing interest in the development of fabrication techniques to cost effectively mass-prod...
We report a fabrication approach for three-dimensional (3-D) microstructures having functional metal...
Electrodeposition of photoresist on highly structured surfaces is combined with electroplating to fa...
A new microfabrication technology capable of electro-depositing truly three dimensional metal micro-...
Two concepts for use in the fabrication of three-dimensional (3D) microstructures with complex topol...
The development of microsystem technology has initiated various types of microfabrication processes....
We investigated the combination of electroless and electrolytic plating of nickel, copper, and ferri...
If micromachines can be produced with metal microstructures, their application field will be greatly...
Metallic micro devices have advantages over silicon-based microdevices when subjected to high stress...