In the thickness range 50nm-500nm at substrate temperatures of 300K, 375K, and 575K the structure of physical-vapour-deposited magnesium, lanthanum, calcium, and lithium fluoride films were investigated using TEM microfractographical replication technique. Two growth groups, columnar and granular growth, were found and main structure buildings elements with its characteristical medium size have been determined. Using SIMS, SNMS, RBS, and partially spectroscopical and gravimetrical measurements, the O and C contamination of the films has been investigated. The quantitative results were related to the characteristical structure building elements
LaF3/MgF2 high-reflectance optical multilayer coatings were deposited by e-beam evaporation and inve...
Utilizing thermal Mirage technique, UV laser damage resistivity studies on electron beam evaporeted ...
Fluorescence experiments have been performed to study the interaction of 193 nm laser radiation with...
In the thickness range 50-500 nm at substrate temperatures of 300, 375 and 575 K the structures of p...
A new technique for the fabrication of optical interference layers is being introduced. MgF2, and Nd...
Single layers of MgF2 and LaF3 were deposited upon superpolished fused-silica and CaF2 substrates by...
The present candidates for low loss dielectric optical coatings at VUV excimer laser wavelengths are...
Impurity contents of loosely packed CaF2 and LaF3 films are analysed by SNMS depth-profiling. On the...
The structure evolution characteristics of MgF2 and NdF3 optical thin films on CaF2 (111) substrates...
Lithium fluoride (LiF) films have been prepared on LaAlO3 (LAO), MgO, Si and TiN buffered Si substra...
In high quality otpical coating systems for the DUV-spectral range, MgF2 is one of the preferred dep...
The surface microstructure of evaporated single layer and multilayer fluoride coatings for KrF laser...
A novel atomic layer deposition process for the preparation of fluoride thin films in a temperature ...
The persistent utilization of optical lithography at the DUV and VUV excimer laser wavelengths leads...
As a result of health and safety issues surrounding the use of radioactive materials on coated optic...
LaF3/MgF2 high-reflectance optical multilayer coatings were deposited by e-beam evaporation and inve...
Utilizing thermal Mirage technique, UV laser damage resistivity studies on electron beam evaporeted ...
Fluorescence experiments have been performed to study the interaction of 193 nm laser radiation with...
In the thickness range 50-500 nm at substrate temperatures of 300, 375 and 575 K the structures of p...
A new technique for the fabrication of optical interference layers is being introduced. MgF2, and Nd...
Single layers of MgF2 and LaF3 were deposited upon superpolished fused-silica and CaF2 substrates by...
The present candidates for low loss dielectric optical coatings at VUV excimer laser wavelengths are...
Impurity contents of loosely packed CaF2 and LaF3 films are analysed by SNMS depth-profiling. On the...
The structure evolution characteristics of MgF2 and NdF3 optical thin films on CaF2 (111) substrates...
Lithium fluoride (LiF) films have been prepared on LaAlO3 (LAO), MgO, Si and TiN buffered Si substra...
In high quality otpical coating systems for the DUV-spectral range, MgF2 is one of the preferred dep...
The surface microstructure of evaporated single layer and multilayer fluoride coatings for KrF laser...
A novel atomic layer deposition process for the preparation of fluoride thin films in a temperature ...
The persistent utilization of optical lithography at the DUV and VUV excimer laser wavelengths leads...
As a result of health and safety issues surrounding the use of radioactive materials on coated optic...
LaF3/MgF2 high-reflectance optical multilayer coatings were deposited by e-beam evaporation and inve...
Utilizing thermal Mirage technique, UV laser damage resistivity studies on electron beam evaporeted ...
Fluorescence experiments have been performed to study the interaction of 193 nm laser radiation with...