Impurity contents of loosely packed CaF2 and LaF3 films are analysed by SNMS depth-profiling. On the basis of TEM investigations a quantitative description of the structure of the films is given. The irreversibly incorporated oxygen contents of the films are nearly independent of the film structures. In contrast, the irreversibly incorporated carbon contents are proportional to the inner surfaces of the loosely packed films and to the C-contaminations of appropriate surfaces of compact fluoride samples. It is concluded that the irreversibly incorporated C covers the grain surfaces and the irreversibly incorporated C is located preferably within the grains
In this study, calcium fluoride (CaF2) thin films have been prepared by Thermionic Vacuum Arc (TVA) ...
LaF3 films in the 5 1240 nm thickness range were grown on Si(111) by molecular beam epitaxy. The sub...
Effects of defect propagation from the substrate throughout thin film single layer and multilayer co...
In the thickness range 50-500 nm at substrate temperatures of 300, 375 and 575 K the structures of p...
In the thickness range 50nm-500nm at substrate temperatures of 300K, 375K, and 575K the structure of...
The structure evolution characteristics of MgF2 and NdF3 optical thin films on CaF2 (111) substrates...
LaF3 thin films of different thicknesses were deposited on CaF2 (111) and silicon substrates at a re...
Thin films of PbF2 β and CaF2, two fluoride compounds with very different ionic conductivities, have...
To meet the requirements of comprehensively characterizing the morphology of thin films and substrat...
The surface microstructure of evaporated single layer and multilayer fluoride coatings for KrF laser...
The primary objective of this research is to investigate the effects of process variables on microst...
In this thesis, the morphology and electric potential of pristine and gold covered surfaces with the...
International audienceCleaved (111) surfaces on CaF2 were imaged with scanning force microscopy oper...
This study characterizes thin films of eleven lanthanide trifluorides which are potentially useful f...
In this thesis transmission electron microscopy (TEM) was used to study the atomic structure of LaFe...
In this study, calcium fluoride (CaF2) thin films have been prepared by Thermionic Vacuum Arc (TVA) ...
LaF3 films in the 5 1240 nm thickness range were grown on Si(111) by molecular beam epitaxy. The sub...
Effects of defect propagation from the substrate throughout thin film single layer and multilayer co...
In the thickness range 50-500 nm at substrate temperatures of 300, 375 and 575 K the structures of p...
In the thickness range 50nm-500nm at substrate temperatures of 300K, 375K, and 575K the structure of...
The structure evolution characteristics of MgF2 and NdF3 optical thin films on CaF2 (111) substrates...
LaF3 thin films of different thicknesses were deposited on CaF2 (111) and silicon substrates at a re...
Thin films of PbF2 β and CaF2, two fluoride compounds with very different ionic conductivities, have...
To meet the requirements of comprehensively characterizing the morphology of thin films and substrat...
The surface microstructure of evaporated single layer and multilayer fluoride coatings for KrF laser...
The primary objective of this research is to investigate the effects of process variables on microst...
In this thesis, the morphology and electric potential of pristine and gold covered surfaces with the...
International audienceCleaved (111) surfaces on CaF2 were imaged with scanning force microscopy oper...
This study characterizes thin films of eleven lanthanide trifluorides which are potentially useful f...
In this thesis transmission electron microscopy (TEM) was used to study the atomic structure of LaFe...
In this study, calcium fluoride (CaF2) thin films have been prepared by Thermionic Vacuum Arc (TVA) ...
LaF3 films in the 5 1240 nm thickness range were grown on Si(111) by molecular beam epitaxy. The sub...
Effects of defect propagation from the substrate throughout thin film single layer and multilayer co...