he corona discharge (also called dielectric barrier discharge or silent discharge) is a non- thermal transient gas discharge which can be operated at atmospheric pressure. A novel application of the corona discharge, the deposition of thin films, is discussed regarding economic aspects. Due to the lack of any vaccum equipment the corona discharge is a promising technique for economic inline deposition processes, especially for the finishing of large sized low cost products such as metal bands, polymer foils, paper or textiles. Different types of thin films are presented. Siliconoxide films can be obtained by using siliconorganic precursors. Polymerlike hydrogenated or fluorinated carbon films were deposited using hydrogenated or fluorinated...
The dielectric barrier discharge (DBD) is recognized as a promising tool of thin films deposition on...
Plasma-assisted high speed vapour deposition process for large area substrates (1), in which the sub...
DE 102009020163 A1 UPAB: 20101213 NOVELTY - The method involves producing plasma between a bonding s...
The corona discharge (also called dielectric barrier discharge) is a non-thermal transient gas disch...
Corona discharges (also called dielectric barrier discharges or silent discharges consisting of smal...
Since long time dielectric barrier discharges have been in use for technical applications such as oz...
Surface processing of materials by atmospheric pressure dielectric barrier discharges (DBDs) has exp...
Dielectric-barrier discharges (silent discharges) are non-equilibrium discharges that can be conveni...
The diffuse dielectric barrier discharge in atmospheric pressure air was applied for the thin film d...
In plasma-assisted deposition methods the activation energy necessary for the initiation of chemical...
Pathways of formation and temporal evolution of the diffuse dielectric barrier discharge at atmosphe...
High volume plasma discharges nowadays are the key for economic deposition of thin films on plane (e...
The activation of low pressure gas phases by hot filaments for chemical vapour deposition (CVD) of t...
Thin oxide films have a number of applications in diverse areas such as microelectronics, precision ...
This thesis deals with fundamental investigations of barrierdischarges in order to use this kind of ...
The dielectric barrier discharge (DBD) is recognized as a promising tool of thin films deposition on...
Plasma-assisted high speed vapour deposition process for large area substrates (1), in which the sub...
DE 102009020163 A1 UPAB: 20101213 NOVELTY - The method involves producing plasma between a bonding s...
The corona discharge (also called dielectric barrier discharge) is a non-thermal transient gas disch...
Corona discharges (also called dielectric barrier discharges or silent discharges consisting of smal...
Since long time dielectric barrier discharges have been in use for technical applications such as oz...
Surface processing of materials by atmospheric pressure dielectric barrier discharges (DBDs) has exp...
Dielectric-barrier discharges (silent discharges) are non-equilibrium discharges that can be conveni...
The diffuse dielectric barrier discharge in atmospheric pressure air was applied for the thin film d...
In plasma-assisted deposition methods the activation energy necessary for the initiation of chemical...
Pathways of formation and temporal evolution of the diffuse dielectric barrier discharge at atmosphe...
High volume plasma discharges nowadays are the key for economic deposition of thin films on plane (e...
The activation of low pressure gas phases by hot filaments for chemical vapour deposition (CVD) of t...
Thin oxide films have a number of applications in diverse areas such as microelectronics, precision ...
This thesis deals with fundamental investigations of barrierdischarges in order to use this kind of ...
The dielectric barrier discharge (DBD) is recognized as a promising tool of thin films deposition on...
Plasma-assisted high speed vapour deposition process for large area substrates (1), in which the sub...
DE 102009020163 A1 UPAB: 20101213 NOVELTY - The method involves producing plasma between a bonding s...