The versatile multichannel process monitor system MPM-X, designed for the online control of plasma and ion beam etching and deposition is introduced. It provides a number of important process data like in-situ etch rate and selectivity, deposition rate, film thickness, uniformity, and endpoints. This is achieved by an integration of optical emission spectroscopy OES and interferometry, where no external light source is required, but the plasma itself is used as a light source. According to the multichannel option of the MPM-X system a high degree of redundancy and hence accuracy in the determination of plasma and process data is gained. The process control capabilities of the MPM-X sy stem are demonstrated in this paper for various etch and...
Plasma etch is a semiconductor manufacturing process during which material is removed from the surf...
AbstractLaser micro machining is an innovative manufacturing technology with a wide range of process...
Optical emission spectroscopy has been established as a simple method for simultaneous etch rate det...
Our recently reported multifunctional plasma and deposition sensor Welzel et al., Appl. Phys. Lett....
International audienceLaser interferometry and optical emission spectroscopy are well known techniqu...
In-situ optical diagnostics and ion beam diagnostics for plasma-etch and reactive-ion-beam etch (RIB...
Plasma etching and desmear processes for printed wiring board (PWB) manufacture are difficult to pre...
The second phase development of the multi-chamber plasma etching system MPE 3003 is described herein...
We present a low-cost, high-speed, high-accuracy in situ thin film measurement system for real-time ...
Plasma etch is a semiconductor manufacturing process during which material is removed from the surfa...
By means of ISO 9000 and other by law enforced rules the manufacturing industry is forced to documen...
Sandia National Laboratories has developed a system to monitor plasma processes for control of indus...
Monitoring optical emission has become avaluable tool for the plasma processing of semiconductor mat...
This paper examines the effects of polymer buildup in plasma etching systems and describes a microma...
Plasma process tools, which usually cost several millions of US dollars, are often used in the semic...
Plasma etch is a semiconductor manufacturing process during which material is removed from the surf...
AbstractLaser micro machining is an innovative manufacturing technology with a wide range of process...
Optical emission spectroscopy has been established as a simple method for simultaneous etch rate det...
Our recently reported multifunctional plasma and deposition sensor Welzel et al., Appl. Phys. Lett....
International audienceLaser interferometry and optical emission spectroscopy are well known techniqu...
In-situ optical diagnostics and ion beam diagnostics for plasma-etch and reactive-ion-beam etch (RIB...
Plasma etching and desmear processes for printed wiring board (PWB) manufacture are difficult to pre...
The second phase development of the multi-chamber plasma etching system MPE 3003 is described herein...
We present a low-cost, high-speed, high-accuracy in situ thin film measurement system for real-time ...
Plasma etch is a semiconductor manufacturing process during which material is removed from the surfa...
By means of ISO 9000 and other by law enforced rules the manufacturing industry is forced to documen...
Sandia National Laboratories has developed a system to monitor plasma processes for control of indus...
Monitoring optical emission has become avaluable tool for the plasma processing of semiconductor mat...
This paper examines the effects of polymer buildup in plasma etching systems and describes a microma...
Plasma process tools, which usually cost several millions of US dollars, are often used in the semic...
Plasma etch is a semiconductor manufacturing process during which material is removed from the surf...
AbstractLaser micro machining is an innovative manufacturing technology with a wide range of process...
Optical emission spectroscopy has been established as a simple method for simultaneous etch rate det...