Verfahren und Vorrichtung zum Herstellen harter Kohlenstoffschichten

DE 3442208 A UPAB: 19930922 Hard carbon films are produced on substrates by decomposition of gaseous hydrocarbon cpd. (I) in an ionised gas atmos. in a reactor, using a substrate holder at negative potential. The novelty is that a plasma conc. by closed magnetic field(s) is produced by a magnetron cathode opposite the substrate holder. Pref. the substrate holder is connected to a h.f. generator via a capacitor. The power supplied to the substrate holder is 0.05-0.2 times that supplied to the magnetron cathode. The pressure in the reactor is 3 x 10 power (-3) to 1.2 x 10 power (-2) mbar. O2 is added in the magnetron cathode zone in an amt. of up to 10 vol.% of the gaseous hydrocarbon cpds. Pref. the magnetron cathode has a target of Ta, Ti, Cr, W or an alloy of at least 2 of these as adhesion promoter and (a) an adhesive layer of this metal or alloy is produced in the absence of (I) and (b) a C layer is produced on the target and the substrate by supplying (I). USE/ADVANTAGE - The process is useful for producing pref. amorphous C films, which are useful in the camera industry for camera housings, objective and accessories; decorative films on watch cases, bracelets and other decorative articles; and tools, esp. cutting tools. It is simple to control and gives highly reproducible results. 1/