Accelerated life tests of 0. 15 mu m gate length InAlAs/InGaAs HEMTs were performed under DC electrical stress at four temperatures in nitrogen. By defining a 100 per cent-degradation of transconductance as failure criterion we found an activation energy of 1.8 eV and a projected life time of 5x10(exp 6) h at 125 degree ambient temperature. The degradation was found to be much faster in air than in nitrogen. High temperature storage tests showed that our devices are not sensitive to hydrogen
Gallium nitride high electron mobility transistors are attractive to the DoD for their ability to op...
A wide variety of new data communication applications demand ever-increasing transmission capacities...
The temperature dependence of device degradation of AlGaN/GaN HEMTs on SiC substrate with a gate len...
We report on fabrication, performance and reliability of 0. 15 mu m gate-length passivated InAlAs/In...
The influence of ambient atmosphere on the long term stability of InP-based HEMTs has been investiga...
The reliability and degradation mechanisms of 70 nm gate length metamorphic InAlAs/InGaAs HEMTs for ...
By performing biased accelerated life tests and three dimensional temperature simulations the effect...
The long-term stability of AlGaAs/GaAs and InAlAs/InGaAs high electron mobility transistors (HEMTs),...
The reliability of InAlAs/InGaAs HEMTs grown on GaAs substrate with metamorphic buffer (MHEMT) desig...
The long-term stability of a 50 nm low-noise metamorphic HEMT technology has been investigated by bi...
GaAs/GaAlAs HEMT's are rapidly replacing conventional FET's for applications where high gain and low...
The long term stability of M-HEMTs has been evaluated by means of hot electrons stress test carried ...
A wide variety of new data communication applications demand ever-increasing transmission capacities...
The reliability of AIGaAs/InGaAs pseudomorphic HEMT's has been investigated by means of thermal and ...
In this paper, we discuss the results of three different electrical stress tests on InP-based HEMT's...
Gallium nitride high electron mobility transistors are attractive to the DoD for their ability to op...
A wide variety of new data communication applications demand ever-increasing transmission capacities...
The temperature dependence of device degradation of AlGaN/GaN HEMTs on SiC substrate with a gate len...
We report on fabrication, performance and reliability of 0. 15 mu m gate-length passivated InAlAs/In...
The influence of ambient atmosphere on the long term stability of InP-based HEMTs has been investiga...
The reliability and degradation mechanisms of 70 nm gate length metamorphic InAlAs/InGaAs HEMTs for ...
By performing biased accelerated life tests and three dimensional temperature simulations the effect...
The long-term stability of AlGaAs/GaAs and InAlAs/InGaAs high electron mobility transistors (HEMTs),...
The reliability of InAlAs/InGaAs HEMTs grown on GaAs substrate with metamorphic buffer (MHEMT) desig...
The long-term stability of a 50 nm low-noise metamorphic HEMT technology has been investigated by bi...
GaAs/GaAlAs HEMT's are rapidly replacing conventional FET's for applications where high gain and low...
The long term stability of M-HEMTs has been evaluated by means of hot electrons stress test carried ...
A wide variety of new data communication applications demand ever-increasing transmission capacities...
The reliability of AIGaAs/InGaAs pseudomorphic HEMT's has been investigated by means of thermal and ...
In this paper, we discuss the results of three different electrical stress tests on InP-based HEMT's...
Gallium nitride high electron mobility transistors are attractive to the DoD for their ability to op...
A wide variety of new data communication applications demand ever-increasing transmission capacities...
The temperature dependence of device degradation of AlGaN/GaN HEMTs on SiC substrate with a gate len...