Principles of physical vapor deposition of thin films /

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. Offers detailed derivation of important formulae. Thoroughly covers the basic principles of materials science that are important to any thin film preparation. Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. Offers detailed derivation of important formulae. Thoroughly covers the basic principles of materials science that are important to any thin film preparation. Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.Includes bibliographical references and index.Introduction -- Evaporation -- Plasma state -- Cold plasma discharges -- Thermal evaporation sources -- Gas glow in thin film processing systems -- Special sources -- Gas solid interactions -- Nucleation and growth of films -- Epitaxy -- Substrate preparation -- Structure and properties of films -- Dry etching.Print version record.Elsevie