Vacuum coating installation includes a coating chamber (1) which can be put under vacuum and accommodates a substrate (13) to be coated, and at least one source chamber (3, 3') which is connected to the coating chamber, and houses a source in the form of a cathode (4) for the source material. The coating chamber is vacuum-tight separable from the source chambers which can be put under vacuum. USE - For substrate coating. ADVANTAGE - Drawbacks (contamination of the coating material, low coating uniformity in the case of larger substrates, poor utilisation of the cathode material) of known installations are eliminated
Small parts are to be coated on all sides in a vacuum in a high-productivity process either from an ...
DE 102008028542 A1 UPAB: 20100101 NOVELTY - In a plasma process to apply a coating to a substrate (1...
Submicrometer structures are coated by cathodic sputtering or vaporising a target material in a high...
A coating installation for coating a substrate with simultaneous layer monitoring, comprising a vacu...
DE1005025101 B UPAB: 20060804 NOVELTY - A device for cleaning the interior space of vacuum chambers ...
The installation serves for providing sliding bearings with at least one intermediate coating and at...
DE 19958643 C UPAB: 20010522 NOVELTY - Apparatus for coating an object (3) comprises a vacuum chambe...
WO2003087426 A UPAB: 20031120 NOVELTY - A coating device has a cathode chamber (3) and a substrate c...
WO 200013201 A UPAB: 20000426 NOVELTY - A positively charged absorber electrode (2) is positioned in...
In the present modern age, vacuum based coatings are employed in every field of technology to reduce...
The modification of large‐area surfaces by means of thin‐film vacuum coating is a well‐established i...
DE 19841012 C UPAB: 20000313 NOVELTY - One or more hollow cathodes (7), one or more ring anodes (10)...
DE 102007019982 A1 UPAB: 20090103 NOVELTY - In a process to apply a coating to a substrate in a vacu...
DE 10254427 A UPAB: 20040716 NOVELTY - Device for coating a substrate comprises an isolator (3) arra...
Glow discharge pretreatment of substrate surfaces in vacuum, prior to vacuum coating, involves maint...
Small parts are to be coated on all sides in a vacuum in a high-productivity process either from an ...
DE 102008028542 A1 UPAB: 20100101 NOVELTY - In a plasma process to apply a coating to a substrate (1...
Submicrometer structures are coated by cathodic sputtering or vaporising a target material in a high...
A coating installation for coating a substrate with simultaneous layer monitoring, comprising a vacu...
DE1005025101 B UPAB: 20060804 NOVELTY - A device for cleaning the interior space of vacuum chambers ...
The installation serves for providing sliding bearings with at least one intermediate coating and at...
DE 19958643 C UPAB: 20010522 NOVELTY - Apparatus for coating an object (3) comprises a vacuum chambe...
WO2003087426 A UPAB: 20031120 NOVELTY - A coating device has a cathode chamber (3) and a substrate c...
WO 200013201 A UPAB: 20000426 NOVELTY - A positively charged absorber electrode (2) is positioned in...
In the present modern age, vacuum based coatings are employed in every field of technology to reduce...
The modification of large‐area surfaces by means of thin‐film vacuum coating is a well‐established i...
DE 19841012 C UPAB: 20000313 NOVELTY - One or more hollow cathodes (7), one or more ring anodes (10)...
DE 102007019982 A1 UPAB: 20090103 NOVELTY - In a process to apply a coating to a substrate in a vacu...
DE 10254427 A UPAB: 20040716 NOVELTY - Device for coating a substrate comprises an isolator (3) arra...
Glow discharge pretreatment of substrate surfaces in vacuum, prior to vacuum coating, involves maint...
Small parts are to be coated on all sides in a vacuum in a high-productivity process either from an ...
DE 102008028542 A1 UPAB: 20100101 NOVELTY - In a plasma process to apply a coating to a substrate (1...
Submicrometer structures are coated by cathodic sputtering or vaporising a target material in a high...