Verfahren und Einrichtung zur ionengestuetzten Hochratebedampfung

DE 10018639 C UPAB: 20010603 NOVELTY - Process for ion-promoted high rate vaporization of a substrate (1) comprises igniting a low voltage arc discharge between a plasma screen (9) on the substrate acting as a cathode and an anode (10). Gas is fed into a coating chamber through an anode formed as a hollow anode near to the vaporizer surface. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a device for carrying out the process comprising devices for holding and/or moving a substrate, a low voltage arc discharge for producing a plasma screen in front of the substrate and an anode close to the vaporizer surface. USE - For coating planar and bent substrates with conducting or electrically insulating materials in a high vacuum. ADVANTAGE - The process has high productivity