A software module for the three-dimensional simulation of etching processes has been developed. It works on multilayer structures given as triangulated surface meshes. The mesh is moved nodewise according to rates which in this work have been determined from isotropic and anisotropic components. An important feature of the algorithm is the automatic detection of triple lines along mask edges and the refinement of triangles at these triple lines. This allows for the simulation of underetching. The capabilities of the algorithm are demonstrated by examples such as the simulation of glass etching for the fabrication of a phase shift mask for optical lithography and the etching of an STI trench structure
Due to the focus of popular graphic accelerators, triangle meshes remain the primary representation ...
Abstract—We present new techniques for three-dimensional topography simulation of processes for whic...
AbstractThis paper presents an approach of a 3D cutting simulation with a continuous adaptive remesh...
A software module for the three-dimensional simulation of etching processes has been developed. It w...
A new approach for three-dimensional simulation of Bosch process with arbitrary 2-D mask shape with ...
Appropriate meshes are crucial for accurate and efficient 3D process simulation. In this paper, we p...
The aim of this study is to devise a computer simulation tool, which will speed-up the design of Mic...
This The integrated circuits (ICs) industry uses a number of technology computer aided design (TCAD)...
Abstract — We present the application of level set and fast marching methods to the simulation of su...
We developed a simulation tool for the three-dimensional orientation-dependent wet etching of silico...
Feature-scale simulation of sputter etching has been coupled to equipment parameters by means of tra...
A program for the three-dimensional (3D) simulation of layer depositionhas been developed. It is bas...
In this paper a methodology for the three dimensional (3D) modeling and simulation of the profile ev...
This paper presents a new 3D simulator, an extended version of our previous developed 2D simulator [...
A program for the three-dimensional (3D) simulation of layer deposition processes has been developed...
Due to the focus of popular graphic accelerators, triangle meshes remain the primary representation ...
Abstract—We present new techniques for three-dimensional topography simulation of processes for whic...
AbstractThis paper presents an approach of a 3D cutting simulation with a continuous adaptive remesh...
A software module for the three-dimensional simulation of etching processes has been developed. It w...
A new approach for three-dimensional simulation of Bosch process with arbitrary 2-D mask shape with ...
Appropriate meshes are crucial for accurate and efficient 3D process simulation. In this paper, we p...
The aim of this study is to devise a computer simulation tool, which will speed-up the design of Mic...
This The integrated circuits (ICs) industry uses a number of technology computer aided design (TCAD)...
Abstract — We present the application of level set and fast marching methods to the simulation of su...
We developed a simulation tool for the three-dimensional orientation-dependent wet etching of silico...
Feature-scale simulation of sputter etching has been coupled to equipment parameters by means of tra...
A program for the three-dimensional (3D) simulation of layer depositionhas been developed. It is bas...
In this paper a methodology for the three dimensional (3D) modeling and simulation of the profile ev...
This paper presents a new 3D simulator, an extended version of our previous developed 2D simulator [...
A program for the three-dimensional (3D) simulation of layer deposition processes has been developed...
Due to the focus of popular graphic accelerators, triangle meshes remain the primary representation ...
Abstract—We present new techniques for three-dimensional topography simulation of processes for whic...
AbstractThis paper presents an approach of a 3D cutting simulation with a continuous adaptive remesh...